Hostname: page-component-848d4c4894-4rdrl Total loading time: 0 Render date: 2024-07-06T12:31:38.305Z Has data issue: false hasContentIssue false
  • English
  • Français

Patterned ZnS Thin-Film Growth using KrCl Excimer Lamp on the Zn Nuclei

Published online by Cambridge University Press:  10 February 2011

M. Toda ,
H. Lizuka  and
M. Murahara
M. Toda
Affiliation:
Department of Electrical Engineering, Tokai University 1117 Kitakaname, Hiratsuka, Kanagawa, 259–1292, JAPAN
H. Lizuka
Affiliation:
Department of Electrical Engineering, Tokai University 1117 Kitakaname, Hiratsuka, Kanagawa, 259–1292, JAPAN
M. Murahara
Affiliation:
Department of Electrical Engineering, Tokai University 1117 Kitakaname, Hiratsuka, Kanagawa, 259–1292, JAPAN
Get access

Abstract

Patterned Zn nuclei were formed by exposure with a single shot of an ArF excimer laser through a patterned photo mask onto a Si substrate which adsorbed DMZ (dimethylezinc). A ZnS thin film was then grown only onto the patterned Zn nuclei by KrCl excimer lamp irradiation of the substrate which was sealed in the chamber along with DMZ and H2S.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 585: Symposium L – Fundamental Mechanisms of Low-Energy-Beam Modified Surface , 1999 , 147
Copyright
Copyright © Materials Research Society 2000

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Kawai, T. and Hanabusa, M., Jpn. J. Appl. Phys. 32, 4690– (1993).Google Scholar
2. Zhu, Nongfan, Cacours, Ted, Scarmozzio, Rob, and Osgood, Richard M. Jr, J. Vac. Sci. Technol. B 10 (3), 1167– (1992).Google Scholar
3. Higashi, G. S., Applied Surface Science 43, 6– (1989).Google Scholar
4. 4. Yamane, K. and Murahara, M., The Institute of Electrical Engineers of Jpn. Symp. Proc., OQD-93–50 (1993).Google Scholar