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Pattern Formation via a Two-Step Faceting Transition on Vicinal Si(111) Surfaces

  • F.K. Men (a1), Feng Liu (a2), P.J. Wang (a1), C.H. Chen (a1), D.L. Cheng (a1), J.L. Lin (a3) and F.J. Himpsel (a3)...

Abstract

We demonstrate a self-organized pattern formation on vicinal Si(111) surfaces that are miscut toward the [211] direction. All the patterns, consisting of a periodic array of alternating (7×7) reconstructed terraces and step-bunched facets, have the same periodicity and facet structure, independent of the miscut angle; while the width of the facets increases linearly with miscut angle. We attribute such unique pattern formation to a surface faceting transition that involves two transition steps: the first step forms a stress-domain structure defining the universal periodicity; the second step forms the low-energy facets controlling the facet width.

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Pattern Formation via a Two-Step Faceting Transition on Vicinal Si(111) Surfaces

  • F.K. Men (a1), Feng Liu (a2), P.J. Wang (a1), C.H. Chen (a1), D.L. Cheng (a1), J.L. Lin (a3) and F.J. Himpsel (a3)...

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