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Oriented Carbon Nanotube Growth for Field Emission Applications

Published online by Cambridge University Press:  10 February 2011

A.N. Obraztsov ,
I. Pavlovsky ,
A.P. Volkov ,
V.L. Kuznetsov  and
A.L. Chuvilin
A.N. Obraztsov
Affiliation:
Physics Department of Moscow State University, Moscow 119899, RUSSIA, alex@obraz.phys.msu.su, http://carbon.phys.msu.su
I. Pavlovsky
Affiliation:
Physics Department of Moscow State University, Moscow 119899, RUSSIA, alex@obraz.phys.msu.su, http://carbon.phys.msu.su
A.P. Volkov
Affiliation:
Physics Department of Moscow State University, Moscow 119899, RUSSIA, alex@obraz.phys.msu.su, http://carbon.phys.msu.su
V.L. Kuznetsov
Affiliation:
Institute of Catalysis, Novosibirsk 630090, RUSSIA
A.L. Chuvilin
Affiliation:
Institute of Catalysis, Novosibirsk 630090, RUSSIA
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Abstract

Oriented carbon nanotube films were grown using a method of chemical vapor deposition in hydrogen/methane plasma activated by glow discharge. The film phase composition and structural features were studied by Raman, SEM, TEM, and HRTEM techniques. Field emission properties of the films were examined to obtain I-V characteristics and the field emission site distribution. The I-V curves in Fowler-Nordheim coordinates were linear, that is typical for the field emission, with the threshold average field about 1.5 V/μm and the emission current density up to 50 mA/cm2 at the field of 5 V/μm. The emission site density reached 107 cm2 at the same value of electrtic field.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 558: Symposium B – Flat-Panel Displays and Sensors-Principles, Materials… , 1999 , 111
Copyright
Copyright © Materials Research Society 2000

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References

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