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Optical Waveguide Fabrication by Stoichiometric Implantation of Ti and O into LiNbO3 *

  • D. B. Pokers (a1) and W. Xia (a2)


X-cut substrates of LiNbO3 have been implanted at 500°C with Ti and O to doses of 2.5 and 7.5×l017 ions/cm2, respectively. The high substrate temperature during implantation ensures dynamic recrystallization, preserving the crystallinity of the LiNbOs-The stability of the stoichiometric implants is enhanced sufficiently that annealing at 1000°C proceeds with no surface degradation of the substrate. Annealing under identical conditions without the 0 implant usually results in phase separation of an oxide at the surface, even when annealing is performed immediately following implantation. Samples implanted with Ti and O to preserve the stoichiometric metahoxygen ratio of the substrate can be stored at room temperature for several months without phase separation. Planar optical waveguides have been produced by stoichiometric implantation followed by annealing in water-saturated oxygen for one hour at temperatures of 900 and 1000°C. The sample annealed at 900°C supported a single lossy mode, while the 1000°C sample supported two propagating modes and one lossy mode at λ=0.6μm.



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Sponsored by the Division of Materials Sciences, U.S. Department of Energy under contract DE-AC05-84OR21400 with Martin Marietta Energy Systems, Inc.



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