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Optical Fiber Pyrometry with in-Situ Detection of Wafer Radiance and Emittance—Accufiber's Ripple Method
Published online by Cambridge University Press: 21 February 2011
Abstract
A two-channel optical-fiber pyrometry technique for simultaneous measurement of thermal radiance and emittance was used to measure and control the temperature of silicon wafers heated by quartz-halogen-tungsten lamps in various rapid-thermal processors, including an A.G. Associates Heatpulse. The ripple method dynamically determines emittances by sensing time-dependent components in radiation from the lamps and radiation reflected by the wafer surface. Wafers were coated with films of various textures and patterns to test the technique over a range of surface emittances spanning about an order of magnitude. Temperature accuracies of at least ±5°C are achievable from 650°C to 1050°C, and above, for pyrometry at lμm wavelength.
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- Copyright © Materials Research Society 1993
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