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Optical Behavior of Sputter-Deposited Aluminum Nitride: Relationship to Film Cheiistry

  • C. J. G. Kubiak (a1), C. R. Aita (a1), F. S. Hickernell (a2) and S. J. Joseph (a2)

Abstract

Films which are nominally aluminum nitride were grown by reactive sputter deposition using an aluminum target and rf-excited nitrogen discharges operated at power levels from 100 to 800W. Depositions were made on water-cooled (111)-cut Si and amorphous quartz substrates. The optical behavior of these films and its relationship to chemistry is discussed in the present paper.

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