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Optical and Magnetic Properties of Silica Implanted with N+ and Fe+

Published online by Cambridge University Press:  21 February 2011

T. Isobe ,
R.A. Weeks  and
R.A. Zuhr
T. Isobe
Affiliation:
Faculty of Science and Engineering, Keio University, 3-14-1 Hiyoshi, Yokohama 223, Japan, isobe@applc.keio.ac.jp.
R.A. Weeks
Affiliation:
Applied Science and Engineering, Vanderbilt University, Nashville, TN 37235, U.S.A., ravv@vuse.vanderbilt.edu.
R.A. Zuhr
Affiliation:
Solid State Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, U.S.A., zur@solid.ssd.ornl.gov.
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Abstract

Silica platelets (Corning 7940) were implanted sequentially with N at 52 keV to different doses ranging from 0 to 1.2×l017 ions cm2 and then with Fe at 160 keV to a dose of 6×10 ions cm2. The optical absorption decreased with increasing N1 dose at photon energies ranging from 1.4 eV to 6.5 eV. The relative intensity, S(0°), of the ferromagnetic resonance absorption and its resonance field, H(0°), at θ = 0° were larger than S(90°) and H,(90°) at 0 = 90°, where Θ is the angle between the applied magnetic field and the normal to the implanted surface. The maximum values of S(0°) and S(90°) were observed near the N/Fe atomic ratio of 0.2. At the similar atomic ratio, the differential relative intensity, S(0°)- S(90°), and the differential resonance field, H,(0°)-H,(90°). associated with the degree of magnetic interaction between the produced compounds, also showed maxima. We conclude that sequential ion-implantation of N1 and Fe1 into silica causes a chemical interaction to produce iron nitrides.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 396: Symposium A – Ion-Solid Interactions for Materials Modification and Processing , 1995 , 411
Copyright
Copyright © Materials Research Society 1996

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References

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