Hostname: page-component-8448b6f56d-m8qmq Total loading time: 0 Render date: 2024-04-25T04:13:40.831Z Has data issue: false hasContentIssue false
  • English
  • Français

On the Perpendicular Magnetic Anisotropy of Pt/Co Multilayers: Structure-Property Relationships

Published online by Cambridge University Press:  15 February 2011

G. A. Bertero  and
R. Sinclair
G. A. Bertero
Affiliation:
Department of Materials Science and Engineering, Stanford University, Stanford, CA 94305
R. Sinclair
Affiliation:
Department of Materials Science and Engineering, Stanford University, Stanford, CA 94305
Get access

Abstract

A series of Pt/Co multilayers were sputter-deposited under various deposition conditions to promote structural changes resulting in marked differences in both the perpendicular anisotropy and magnetic coercivity. High resolution transmission electron microscopy was used in combination with other analytical techniques to study the structure of these films. It was found that the most important feature controlling the magnitude of the anisotropy is the interface sharpness. Conversely properties such as the quality of the (111) texture, grain shape or the defect structure, were found to be of secondary importance. The magnetic coercivity ranged from 0.6 to 7 kOe depending on the sputtering conditions and was found to depend strongly on the grain boundary structure rather than on the grain size.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 343: Symposium H – Polycrystalline Thin Films - Structure, Texture, Properties and Applications , 1994 , 369
Copyright
Copyright © Materials Research Society 1994

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Hashimoto, S., Maesaka, A., Fujimoto, K. and Bessho, K., J. Magn. Magn. Mater. 121 471 (1993).Google Scholar
2. Weller, D., Hurst, J., Notarys, H., Braindle, H., Farrow, R.F.C., Marks, R. and Harp, G., J. Mag. Soc. Jap. 17 72 (1992).Google Scholar
3. Lairson, B.M., Perez, J. and Balwin, C., Appl. Phys. Lett. (in press) (1994).Google Scholar
4. Carcia, P.F., Li, Z.G. and Zeper, W.B., J. Magn. Magn. Mater. 121 452 (1993).CrossRefGoogle Scholar
5. Carcia, P.F., Shah, S.I. and Zeper, W.B., Appl. Phys. Lett. 56 2345 (1990).Google Scholar
6. Bravman, J.C. and Sinclair, R., J. Electron Microsc. Tech. 1 53 (1984).Google Scholar
7. Chien, C.J., Farrow, R.F.C., Lee, C.H., Lin, C.J. and Marinero, E.E., J. Magn. Magn. Mater. 93 47 (1991).Google Scholar
8. Bertero, G.A. and Sinclair, R., J. Magn. Magn. Mater. (in press) (1994).Google Scholar
9. Néel, L., Journal of Physical Radium 15 225 (1954).Google Scholar