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OES, LIF, and MS Studies of Silane, Disilane, and Chlorosilane Plasmas

  • H. U. Lee (a1), R. C. Ross (a1) and J. P. De Neufville (a1)

Abstract

Using optical emission spectroscopy (OES), mass spectrometry (MS), and laser-induced fluorescence (LIF), we are investigating a number of glow-discharge reactions as a function of RF power, flow rates, partial pressures, and H2 dilution under realistic thin-film deposition conditions.In this paper we report on the preliminary results of two studies:

  1. 1)The formation of radical and polymeric species in SiH4 and Si2H6 plasmas, and
  2. 2)The characterization of SiF4 + H2 plasmas and the detection of HSiCl and HSiF in the plasmas of SiH2Cl2 and SiH2F2, respectively.

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References

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1. Lee, H.U., de Neufville, J.P., and Ovshinsky, S.R., J.Non-Cryst.Solids 59 & 60, 671 (1983); H.U.Lee, J.P.de Neufville, and S.R.Ovshinsky, J.Non-Cryst.Solids, 66, 39 (1984); Chem.Phys.Lett.99, 394 (1983).
2. Ross, R.C. and Jaklik, J. Jr, J.Appl.Phys. 55, 3785 (1984).
3. Kampas, F.J., in Semiconductors and Semimetals, ed.by Pankove, J.I. (Academic Press, New York, 1984) pp.153177.
4. Gallagher, A., in Plasma Synthesis and Etching of Electronic Materials, MRS Symp.Proc., Vol.38, pp.99110 (1985).
5. Haller, I., Appl.Phys.Lett. 37, 282 (1980).
6. Turban, G., Catherine, Y., and Grolleau, B., Thin Solid Films 67, 309 (1980).
7. S.R.Ovshinsky and A.Madan, U.S.Patent 4,226,898; Madan, A., Ovshinsky, S.R., and Benn, E., Philos.Mag.B 40, 259 (1979).
8. Janai, M., Weil, R., and Pratt, B., Phys.Rev.B 31, 5311 (1985); M.Janai, L.Frey, R.Weil, and B.Pratt, Solid State Commun.48, 521 (1983); M.Janai, R.Weil, K.H.Levin, B.Pratt, R.Kalish, G.Braunstein, and M.Teicher, J.Appl.Phys.52, 3622 (1981).
9. Matsuda, A., Matsumura, M., Nakagawa, K., Yamasaki, S., and Tanaka, K..J.de Physique 42, C4 (1981); A.Matsuda and K.Tanaka, Thin Solid Films 92, 171 (1982).
10. Morar, J.F., McFeely, F.R., Shinn, N.D., Landgren, G., and Himpsel, F.J., Appl.Phys.Lett. 45, 174 (1984).
11. Senzer, S.N. and Lampe, F.W., J.Appl.Phys. 54, 3524 (1983).
12. Reents, W.D. Jr and Mujsce, A.M., Int.J.Mass Spectrom.Ion Proc. 59, 65 (1984).
13. Matsuda, A., Yagii, K., Kaga, T., and Tanaka, K., Jap.J.Appl.Phys. 23, L576 (1984).
14. Ho, P. and Breiland, W.G., Appl.Phys.Lett. 43, 125 (1983).
15. Augelli, V., Murri, R., and Alba, N., J.Appl.Phys. 54, 248 (1983).
16. Bruno, G., Capezzuto, P., Cicala, G., and Cramarossa, F., Plasma Chem.& Plasma Proc. 6, XXX (1986) (to be published).

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