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A Numerical Simulation of Pulsed Laser Deposition

  • William T. Laughlin (a1) and Edmond Y. Lo (a1)


A numerical simulation of the pulsed laser deposition process has been developed. This model is applied to pulsed laser deposition of carbon, a solid lubricant material. At laser fluences above the ablation threshold, the vapor density and temperature at the substrate are sufficiently high that a continuum flow exists. For typical pulsed laser deposition parameters, plume vapor temperatures and densities are insufficient for significant ionization. However, plume absorption does take place and is regulated by wavelength dependent absorption cross sections of the molecular species. Vapor expansion velocities depend on the absorption of laser radiation and thus the laser wavelength. A simple kinetic theory of deposition predicts the film deposition rate and film thickness profile.



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1 Lo, E.Y., Laughlin, W.T., and Pugh, E.R., “A Numerical Model of the Pulsed Laser Deposition Coating Process”, COLA'93, Knoxville, TN, AIP Conf. Proc. 288, Laser Ablation: Mechanisms and Applications - II, April 1993.
2 Huber, H.P. and Herzberg, G., Spectroscopic Constants of Diatomic Molecules, New York: Van Nostrand Reinhold (1979).
3 Cooper, D.M. and Nicholls, R.W., “Measurements of the Electronic Transition Moments of C2-Band Systems”, J. Quant. Spectrosc. Radiat. Transfer 15, 139 (1975).
4 Zel'dovich, Y.B. and Raizer, Y.P, “Physics of Shock Waves and High Temperature Hydrodynamic Phenomena”, New York: Academic Press, p. 195 (1966).
5 Resendes, D., “Free Electron Laser Simulation Program; Subtask Report: Thermochemical Properties of Ablative Composites”, PSI-1014/TR-791 (1988).

A Numerical Simulation of Pulsed Laser Deposition

  • William T. Laughlin (a1) and Edmond Y. Lo (a1)


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