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A New Poly-Si TFT Employing XeCl Excimer Laser Annealing with Pre-patterned Al Laser Beam Mask

  • Min-Koo Han (a1), Sang-Hoon Jung (a1) and Jae-Hong Jeon (a1)

Abstract

We report new lateral grain growth mechanism by XeCl excimer laser annealing on a-Si film with pre-patterned Al layer. 2000Å-thick Al pattern on 800Å-thick PECVD a-Si film successfully reflects the incident laser beam and results in temperature gradient during the recrystallization process. The TEM images show that grain growth near the boundary between the liquid and the solid region exhibits a different mechanism compared with the conventional ELA. About 1.5 m-long lateral grain has been successfully obtained by single laser irradiation

A poly-Si TFT with single grain boundary in the channel has been fabricated by the proposed excimer laser annealing. An excellent device characteristics such as mobility more than 250cm2/Vsec, high On/Off current ratio of 6.3×106 and low threshold voltage less than 1 V has been obtained. The experimental results show that the mobility, threshold voltage and sub-threshold slope of proposed TFTs are superior to those of the conventional TFTs.

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2. Yamauchi, N., Hajjar, J.-J. J., and Reif, R., IEEE Trans. Electron Devices, 38, 55 (1991).
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4. Jeon, Jae-Hong, and Han, Min-Koo, Proc. of the 18th International Display Research Conference (IDRC) Asia Display '98, 437440 (1998).

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A New Poly-Si TFT Employing XeCl Excimer Laser Annealing with Pre-patterned Al Laser Beam Mask

  • Min-Koo Han (a1), Sang-Hoon Jung (a1) and Jae-Hong Jeon (a1)

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