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A New Low Temperature Thin Film Deposition Process: Energetic Cluster Impact (ECI)
Published online by Cambridge University Press: 21 February 2011
Abstract
A beam of metal cluster ions of variable size is deposited with variable kinetic energy on a substrate. Mirror-like and strongly adhering films are produced on unheated substrates for sufficiently high cluster impact energies. Numerical simulations provide the physical insight why this novel technique gives different, and sometimes superior results compared to conventional methods. Several examples are presented.
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- Research Article
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- Copyright © Materials Research Society 1995
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