Skip to main content Accessibility help

New Approaches for Dry Etching Metal Oxides at low Temperature and High Rates

  • Francois Rousseau (a1), A. Jain (a2), L. Perry (a2), J. Farkas (a2), T. T. Kodas (a2), M. J. Hampden-Smith (a1), M. Paffett (a3) and R. Muenchausen (a3)...


The reactions of metal oxides including CuO, ZnO, V2O5, and PbO with 1,1,1,5,5,5-hexaflouro- 2,4-pentanedione (hfacH) were investigated. A hot-wall reactor was used to react hfacH with metal oxide powders to form sufficient quantities of volatile reaction products for characterization by Infrared Spectroscopy (IR), Elemental Analysis (EA), Nuclear Magnetic Resonance (NMR), Mass Spectroscopy (MS), Thermogravimetric Analysis and Differential Thermal Analysis (DTA). PbO, ZnO and CuO powders reacted rapidly at 200 °C to form the corresponding metal β-diketonates and V2O5 reacted to give OV(hfac)2. A differential cold-wall reactor was to used to measure etch rates of CuOx films as a function of temperature and hfacH partial pressure. AES and XPS analysis of the laser ablation deposited CuOx film annealed in an O2 atmosphere revealed that the film was composed of CuO and Cu2O. Etch rates of up to a I l.βm/min at hfacH partial pressure of 1 Torr at 270 °C were obtained. Laser induced etching of the same CuOx film with hfacH showed evidence of copper oxide removal.



Hide All
1. James, P.M., Thompson, E.J., and Ellis, A.B., Chem Maters., 3, 10871092, 1991.
2. Trolier, S., Geist, C., Safari, A., Newnham, R.E., Xu, Q.C., Proc. IEEE Int. Symp. Appl. Ferroel., 6, 707 (1986).
3. Shiosaki, T., Masuda, H., Adachi, M., Kawabata, A., Ultrason, Symp. Proc., 2, 1115, (1987).
4. Asselanis, D., Mancha, S.D., U.S., 11, (1988).
5. Bohac, P.A.F., Patentschrift, 4, (1988).
6. Tenchev, S., Supercond. Science. Technology, 3 (10), 500 (1990).
7. Kita, S., Tanabe, H., Kobayashi, T., IEEE Trans. Magn., 25 (2), 907–10 (1990).
8. Wang, S., Cui, G., Dai, Y., Jiang, H., Zeng, X., Li, J., Bao, Z., Wang, S., Li, C., et al., IEEE Trans Magn., 25 (92), 893 (1989).
9. Tam, A.C., Leung, W.P., and Krajnovich, D., J. Appl. Phys. 69 (4), 2072 (1991).
10. Jette, A.N., Green, W.J., J. Appl. Phys., 68 (10), 5273 (1990).
11. Eyett, M., Baeuerle, D., Wersing, W., Thomann, H., J. Appl. Phys., 52 (4), 1511 (1987).
12. Ruzyllo, J., Solid State Technology, Mar., S1–S4, 1990.
13. Loewenstein, L.M. and Tipton, C.M., J. Electrochem. Soc., 138, 5, 13891394, 1991.
14. Nobinger, G.L., Moskowitz, D.J., and Krusell, W.C., Microcontamination, April, 21–26 & 68–69, 1992.
15. Ruzyllo, J., Hoff, A.M., Frystak, D.C., and Hossain, S.D., J. Electrochem. Soc., 136, 14751476, 1989.
16. Gluck, R.M., Patent, U.S. # 4,159,917, July, 1979.
17. Ruzyllo, J., Duranko, G.T., and Hoff, A.M., J. Electrochem. Soc., 134, 20522055, 1987.
18. Rousseau, F., Farkas, J., Kodas, T.T., and Hampden-Smith, M., In Preparation, 1991.
19. Xue, G., Dong, J., Sheng, Q., J. Chem. Soc. Dalton Trans., 407 (1991).
20. Sekine, R., Kawai, M., Hikita, T., and Hanada, T., Surface Science, 242, 508 (1991).
21. Jain, A., Chi, K.M., Kodas, T.T., M.J. Hampden-Smith, Farr, J.D., and Paffett, M.F., Chem. Mater., 3, 995 (1991).
22. Doyle, G., Eriksen, K.A., D. Van Engen, Organometallics, 4, 830, (1985).s


Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed