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Nanostructured Silicon thin films Deposited by PECVD in the Presence of Silicon Nanoparticles

Published online by Cambridge University Press:  15 February 2011

G. Viera ,
P. Roca i Cabarrocas ,
S. Hamma ,
S. N. Sharma ,
J. Costa  and
E. Bertran
G. Viera
Affiliation:
Dep. Física Aplicada i Electrònica, Universitat de Barcelona. Avgda. Diagonal, 647, E08028 Barcelona, Spain.
P. Roca i Cabarrocas
Affiliation:
Laboratoire de Physique des Interfaces et des Couches Minces. (CNRS, UPR 258), Ecole Polytechnique, F91128 Palaiseau, France.
S. Hamma
Affiliation:
Laboratoire de Physique des Interfaces et des Couches Minces. (CNRS, UPR 258), Ecole Polytechnique, F91128 Palaiseau, France.
S. N. Sharma
Affiliation:
Dep. Física Aplicada i Electrònica, Universitat de Barcelona. Avgda. Diagonal, 647, E08028 Barcelona, Spain.
J. Costa
Affiliation:
Grup de Recerca en Materials, Dept. d'Enginyeria Industrial Universitat de Girona Avgda, Lluis Santaló s/n E17071 Girona, Spain
E. Bertran
Affiliation:
Dep. Física Aplicada i Electrònica, Universitat de Barcelona. Avgda. Diagonal, 647, E08028 Barcelona, Spain.
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Abstract

Nanostructured silicon thin films have been deposited by plasma enhanced chemical vapor deposition at low substrate temperature (100 °C) in the presence of silicon nanoparticles. The nanostructure of the films was revealed by transmission electron microscopy, Raman spectroscopy and X-ray diffraction, which showed ordered silicon domains (1–2 nm) embedded in an amorphous silicon matrix. These ordered domains are due to the particles created in the discharge that contribute to the film growth. One consequence of the incorporation of nanoparticles is the accelerated crystallization of the nanostructured silicon thin films when compared to standard a-Si:H, as shown by the electrical characterization during the annealing.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 467: Symposium A – Amorphous and Microcrystalline Silicon Technology - 1997 , 1997 , 313
Copyright
Copyright © Materials Research Society 1997

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References

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