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A Multiple Quantum NMR (MQNMR) Study of Hydrogen Microstructure in Boron Doped a-Si:H

  • S. Mitra (a1), D. H. Levy (a1), K. K. Gleason (a1), H. Jia (a2) and J. Shinar (a2)...

Abstract

An IR and multiple quantum NMR (MQNMR) study of hydrogen microstructure in three boron doped a-Si:H is discussed. The total Si-bonded H content of all films was 6.5 ± 1.0 at.% as determined by the 640 cm-1 IR wagging mode, but their boron content, which was determined by secondary ion mass spectrometry, ranged from 0.02 to 0.3 at. %. The number of correlated hydrogen, as measured at a preparation time of 600 μSwas found to be more weakly dependent on the boron content than previously observed in phosphorous-doped glow-discharge films. Upon annealing at 220 °C the MQNMR spectrum show a moderate increase in the number of correlated hydrogen in all three samples.

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A Multiple Quantum NMR (MQNMR) Study of Hydrogen Microstructure in Boron Doped a-Si:H

  • S. Mitra (a1), D. H. Levy (a1), K. K. Gleason (a1), H. Jia (a2) and J. Shinar (a2)...

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