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Multilevel Contact System with a Thin Silicide Reaction Controlling Interlayer

  • F. Fenske (a1), S. Schulze (a2), B. Selle (a1), H. Lange (a1) and W. Wolke (a2)...

Abstract

Taking advantage of controllable interdiffusion and reaction processes by using a 50 nm thin Ti interlayer an annealing step in the temperature range from 450 to 475°C transforms the TiNiAg layer sequence on silicon into a stable final state, whereby a contamination free, homogeneous nanoscale NiSi contact layer arises with low values of the contact resistance. Intercalating a thin Ti layer the nickel silicide growth rate is lowered by 2 orders of magnitude. Low sheet resistance and a good bondability are preserved by the remaining Ni-Ag top layer sequence which does not interact during the contact formation process.

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1. Tu, K.N., Hammer, W.N., Olowolafe, J.O., J.Appl.Phys. 51, 1663 (1980).
2. Fenske, F. et al. , Patent DD 277 602, (21 December 1987).
3. Lee, J.-H., Rozgonyi, G.A., Patnaik, B.K., Knoesen, D., Adams, D., Balducci, P., Salih, A.S.M., J.Appl. Phys. 73, 4023 (1993).
4. Duchateau, J.P.W.B., Kuiper, A.E.T., Lathouwers, E.G.C., Reader, A.H., J.Vac.Sci.Technol. A11, 6 (1993).
5. Murarka, S.P., J.Vac.Sci.Technol. B2, 693 (1984).
6. Kattelus, H.P., Nicolet, M.-A., in Diffusion Phenomena in Thin Films and Microelectronic Materials, edited by Gupta, D. and Ho, P.S. (Noyes Publications, Park Ridge, New Jersey,1988), p.432.
7. Reeves, G.K., Solid-State Electr. 23, 487 (1980).
8. Setton, M., Spiegel, J. van der, Santiago, J.J., Wei, C.S., Le vide les couches minces 42, 145 (1987).
9. Lien, C.-D., Nicolet, M.-A., Lau, S.S., Thin Solid Films 143, 63 (1986).
10. Meng, W.J., Fultz, B., Ma, E., Johnson, W.L., Appl. Phys. Lett. 51, 661 (1987).
11. Hung, L.S., Wang, S.Q., Mayer, J.W., Saris, F.W., Mat.Res.Symp.Proc. 54, 161 (1986).
12. Lee, C.H., Wong, Y.M., Doherty, C., Tai, K.L., Lane, E., Bacon, D.D., Baiocchi, F., Katz, A., J. Appl. Phys. 72, 3808 (1992).
13. Fenske, F., Lange, H., Elstner, L., presented at the 13th General Conference, Regensburg, Germany, March 29 - April 2, 1993 (unpublished).
14. Cowley, A.M., Solid-State Electr. 13, 403 (1970).
15. Andrews, J.M., Koch, F.B., Solid-State Electr. 14, 901 (1971).
16. Chen, L.J., Lur, W., Cheng, J.Y., Thin Solid Films 191, 221 (1990).

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