Simple multilayer structures and multilayer diffraction gratings are now of sufficient quality to be used as optical elements in synchrotron radiation source instrumentation. In this paper results obtained with a multilayer two element monochromator will be presented. Three specific types of results will be discussed. First, transmission measurements of the absorption cross-sections of elemental thin films in the energy range 50 to 2000 eV will be presented and used to demonstrate the performance of the monochromator. Second, application of this monochromator in x-ray lithography research will be described and the advantages of the broad bandpass of multilayer optics demonstrated. Third, use of this monochromator in scattering studies of long period structures will be discussed. The potential for the use of multilayer diffraction gratings in high resolution monochromator applications will also be considered.