Dangling bond defects (DB) in silicon microcrystallines and clusters embedded in SiO2 have been studied by X- and Q-band electron paramagnetic resonance (EPR) spectroscopy. The EPR spectra due to the DB were remarkably depending on the grain size, which was controlled by annealing temperature. The microcrystalline containing film shows a broad and unsymmetrical EPR signal at g = 2.006 with the line width of 13 G in X-band spectra. The signal can be simulated by using the anisotropic g-values of Pb center. The Si cluster samples obtained from the annealing at less than 800°C give an asymmetric EPR spectra at about g = 2.004 with the line width of about 9 G in X-band. The EPR signal due to the E' center was also observed.