Hostname: page-component-8448b6f56d-jr42d Total loading time: 0 Render date: 2024-04-18T23:18:28.084Z Has data issue: false hasContentIssue false
  • English
  • Français

Morphology of Diamond Films Grown by DC Plasma Jet CVD

Published online by Cambridge University Press:  26 February 2011

Kazuaki Kurihara ,
Ken-Ichi Sasaki ,
Motonobu Kawarada  and
Nagaaki Koshino
Kazuaki Kurihara
Affiliation:
FIJITSU LABORATORIES LTD., 10-1, Morinosato-Wakamiya, Atsugi 243-01, Japan
Ken-Ichi Sasaki
Affiliation:
FIJITSU LABORATORIES LTD., 10-1, Morinosato-Wakamiya, Atsugi 243-01, Japan
Motonobu Kawarada
Affiliation:
FIJITSU LABORATORIES LTD., 10-1, Morinosato-Wakamiya, Atsugi 243-01, Japan
Nagaaki Koshino
Affiliation:
FIJITSU LABORATORIES LTD., 10-1, Morinosato-Wakamiya, Atsugi 243-01, Japan
Get access

Abstract

It is well known that diamond films synthesized from the gas phase have well defined crystal habits which are affected strongly by synthesis conditions. Though there have been many studies of the morphologies of diamond films synthesized by microwave plasma CVD [1,2,3], there have been relatively few reports on the morphologies of these films grown using new high growth rate techniques such as DC plasma jet CVD [4]. Morphology control is very important to keep flat surface, when producing thick diamond films by high growth rate techniques. In this paper we report our investigation of the morphology and growth of diamond films synthesized by DC plasma jet CVD.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 162: Symposium F – Diamond, Silicon Carbide and Related Wide Bandgap Semiconductors , 1989 , 115
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFRENCES

1. Sato, Y., New Diamond, Ohmsha, Ltd. Tokyo, Japan, 30(1988).Google Scholar
2. Kobashi, K., Nishimura, N., Miyata, K., Kawate, Y., and Glass, J.T., Extended Abstracts of MRS 1988 Spring Meeting, 107(1988)Google Scholar
3. Badzian, A.R. and Badzian, T., Extended Abstracts of MRS 1988 Spring Meeting, 27(1988)Google Scholar
4. Kurihara, K., Sasaki, K., Kawarada, M., and Koshino, N., Appl. Phys. Lett. 52(6), 437(1988).Google Scholar
5. Kurihara, K., Sasaki, K., and Kawarada, M., Fujitsu Scientific and Technical Journal, 25(1), 44(1989).Google Scholar