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Molecular Dynamics Simulations of Growth and Low-Energy Ion Polishing of Thin Molybdenum Films for EUV Multilayer Mirrors

Published online by Cambridge University Press:  10 February 2011

Peter Klaver ,
Wim Goedheer ,
Fred Bijkerk  and
Barend J. Thijsse
Peter Klaver
Affiliation:
FOM Institute for Plasma Physics Rijnhuizen, Dept of Laser Plasma & XUV Optics, Edisonbaan 14, 3439 MN Nieuwegein, The Netherlands; klaver@tnw.tudelft.nl
Wim Goedheer
Affiliation:
FOM Institute for Plasma Physics Rijnhuizen, Dept of Laser Plasma & XUV Optics, Edisonbaan 14, 3439 MN Nieuwegein, The Netherlands;
Fred Bijkerk
Affiliation:
FOM Institute for Plasma Physics Rijnhuizen, Dept of Laser Plasma & XUV Optics, Edisonbaan 14, 3439 MN Nieuwegein, The Netherlands;
Barend J. Thijsse
Affiliation:
Delft University of Technology, Dept of Materials Science, The Netherlands.
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Abstract

We report on the simulation of the growth and subsequent krypton ion polishing of thin molybdenum films, required for extreme ultraviolet multilayer mirror fabrication. We have used a comprehensive Molecular Dynamics (MD) code, principally enabling a simulation of the deposition, ion bombardment and annealing processes. Ion energies used are in the sub-keV range, and the ion angle of incidence is varied between 30 and 60 degrees off-normal.

The effects of ion polishing on the surface roughness are discussed, as well as the increase in (surface) atom mobility. We also report data on sputtering yields, ion penetration depths, trapping, energy transfer and krypton implantation and saturation.

The results are compared with TRIM results, and the relevance of MD and TRIM simulations for specific purposes is discussed. Also, the effects of short-time, high-temperature annealing of an amorphous film are investigated.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 585: Symposium L – Fundamental Mechanisms of Low-Energy-Beam Modified Surface , 1999 , 305
Copyright
Copyright © Materials Research Society 2000

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References

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