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MOCVD-TiN Barrier Layers for ULSI Applications

  • Ivo J. Raaijmakers (a1), Raymond N. Vrtis (a2), Jack Yang (a1), Seshadri Ramaswami (a3), Andre Lagendijk (a2), David A. Roberts (a2) and Eliot K. Broadbent (a1)...

Abstract

Material properties are reported of high quality TiN thin films, deposited by a low temperature (400 – 450 C) and low pressure (10 Torr) metalorganic chemical vapor deposition process using tetrakis(diethylamino)Ti and ammonia. Layer resistivities of less than 200 μΩ cm are achieved in 300 to 500 A thick films. The carbon and oxygen content in the films is found to be low (<3% C, <0.5% O). Conformality of the films in small contact holes is sufficient for the films to be applicable as diffusion barrier and adhesion layers in integrated circuit manufacturing at the 0.25 μΩgeneration.

Integration of the MOCVD-TiN films in a Ti/TiN/Al-alloy metallization scheme is also reported. The diffusion barrier performance of the MOCVD-TiN layers is found to exceed that of PVD-TiN layers.

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MOCVD-TiN Barrier Layers for ULSI Applications

  • Ivo J. Raaijmakers (a1), Raymond N. Vrtis (a2), Jack Yang (a1), Seshadri Ramaswami (a3), Andre Lagendijk (a2), David A. Roberts (a2) and Eliot K. Broadbent (a1)...

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