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MOCVD of HfO2 from Alkoxide and Alkylamide Precursors

  • John L. Roberts (a1), Paul A. Williams (a2), Anthony C. Jones (a1) (a2), Paul Marshall (a3), Paul R. Chalker (a3), Jamie F. Bickley (a1), Hywel O. Davies (a2) and Lesley M. Smith (a2)...

Abstract

The alkoxide and alkylamide complexes [Hf(mmp)4] and [Hf(NMe2)4] 2 are both promising precursors for the MOCVD of HfO2. A comparison has shown that [Hf(NMe2)4] 2 deposits oxide at lower temperatures and over a wider temperature range then [Hf(mmp)4].

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