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Microstructures of Chemical-Vapour-Deposited Tin Films

  • Noboru Yoshikawa (a1) and Atsushi Kikuchi (a1)

Abstract

A gas mixture consisting of TiCl4, H2 and N2 was fed into an externally-heated steel tube, and TiN was deposited on the inner wall by CVD. Microstuctures of the films were observed and their relationships with the preferred crystal orientations were studied. Distributions of the film growth rate and gas concentrations along the axial direction were calculated.

By comparing the film microstructures with the calculated local deposition conditions, it is shown that formation of the films with (110) preferred orientation correlated with the conditions at high temperature and low partial pressure of TiCl4 on the substrate.

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1. Bryant, W.A., J. Mater. Sci. 12, 1285 (1977).
2. Wahl, G. and Schmaderer, F., ibid. 24, 1141 (1989).
3. Yoshikawa, N., Aikawa, H. and Kikuchi, A., J. Japan Inst. Met. 55 571 (1991).
4. Yoshikawa, N., Higashino, K. and Kikuchi, A., ibid. 58 442 (1994).
5. Lotgering, F.K.: J. Inorg. Nul. Chem. 9 113 (1959).
6. Yoshikawa, N. and Kikuchi, A., submitted to Mat. Trans. JIM

Microstructures of Chemical-Vapour-Deposited Tin Films

  • Noboru Yoshikawa (a1) and Atsushi Kikuchi (a1)

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