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Microstructure of BaTiO3 Thin Films Grown by Reduced-Pressure CVD

  • Peter C. Van Buskirk (a1), Robin Gardiner (a1) and Peter S Kirlin (a1)


Polcrystalline BaTiO3 films have been grown on NdGaO3 [100], SrTiO3 [100] and Si [100] substrates by reduced pressure CVD. The substrate temperature was 1000°C and the total pressure during growth was 4 torr. X-ray diffraction measurements indicate highly textured films on the NdGa03 substrate. The orientation was predominantly [100], accompanied by small quantities of various TiO crystalline phases.



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Microstructure of BaTiO3 Thin Films Grown by Reduced-Pressure CVD

  • Peter C. Van Buskirk (a1), Robin Gardiner (a1) and Peter S Kirlin (a1)


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