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Microstructure and Lifetime Study of Al/Y Films

  • L. Vedula (a1), V. Pillai (a1), V. S. Nimmagadda (a1), R. Singh (a1), K. F. Poole (a1), H. Gao (a2) and S. J. Pennycook (a2)...

Abstract

Thin Al films alloyed with three different compositions (0.1%, 1%, 5% by weight) of Yttrium were deposited by D.C. Magnetron Sputtering onto oxidized Si wafer substrates. The samples were furnace annealed at 425 °C for 30 minutes. Resistivity measured for the as-deposited and annealed Al(0. lwt% Y) were 3.07 and 2.57+/−0.25 μΩcm respectively. Al(0. lwt% Y) was also annealed by furnace annealing (FA), rapid thermal annealing (RTA) and rapid photothermal annealing (RPA). RPA gave a residual resistivity of 2.67μΩcm in 5 minutes and at a temperature of 350 C for Al(0. lwt% Y). Mean time to failure for AI(0. lwt% Y) samples at a current density of 3.2+/−0.5×106A/cm2 at 30 C was 50 hours. TEM results showed grain size variation from 0.5 to 2 μm.

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Copyright

COPYRIGHT: © Materials Research Society 1998

References

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1. Iyer, S. S. and Ting, C. Y., IEEE Trans. Electron Devices, 10, 1468 (1984).10.1109/T-ED.1984.21734
2. Cho, J. and Thompson, C. V., Appl. Phys. Lett. 54, 2577 (1989).
3. Dreyer, M. L., Fu, K. Y. and Varker, C. J., J. Appl. Phys, 73, 4894 (1993).
4. Sanchez, J. E., Kraft, O. and Arzt, E., Appl. Phys. Lett., 61 (26), 3121 (1992).
5. Singh, R., Nimmagadda, S. V., Parihar, V., Chen, Y. and Poole, K. F., IEEE Trans. Electron Devices, 45(3), 643(1998).
6. Takayama, S. and Tsutsui, N., J. Vac. Sci. Technol. B 14(5), 3257(1996)
7. Lee, Y. K., Fujimura, N., Ito, T. and Nishida, N., J. Vac. Sci. Technol. B 9(5), 2542(1991)
8. CRC Handbook of Chemistry and Physics, 78th edition, 1997–1998
9. Li, Q., Johnson, E., Madsen, M. B., Johansen, A. and Kristensen, L. S., Phil. Mag. B, vol.66(4), 427(1992).
10. Singh, R., Alamgir, S. and Sharangpani, R., Appl. Phys. Lett., 67, 3939(1995)10.1063/1.114411
11. Menon, S. S., Kemp, K. G., and Poole, K. F., Proc. Southeastcon’91, 383
12. Singh, R. and Sharangapani, R., S. St. Tech., 193(1997)
13. Hu, C. K., Rodbell, K. P., Sullivan, T. D., Lee, K. Y. and Bouldin, D. P., IBM J. Res. Develop., vol.39, 465(1995).
  • Cited by 1

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Microstructure and Lifetime Study of Al/Y Films

  • L. Vedula (a1), V. Pillai (a1), V. S. Nimmagadda (a1), R. Singh (a1), K. F. Poole (a1), H. Gao (a2) and S. J. Pennycook (a2)...

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