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Microstructural Investigation of κ-Modification Layers in CVD α-Al2 O3/K-Al2 O 3 Multilayer Coatings

Published online by Cambridge University Press:  15 February 2011

Mats Halvarsson
Affiliation:
Department of Physics, Chalmers University of Technology, S-412 96 Göteborg, Sweden
Sakari Vuorinen
Affiliation:
Research and Development, SECO Tools AB, S-737 82 Fagersta, Sweden.
Hans Nordén
Affiliation:
Department of Physics, Chalmers University of Technology, S-412 96 Göteborg, Sweden
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Abstract

Multi layer alumina coatings consisting of layers of either pure α-A12 O3 or κ-Al2O3, were deposited in a hot wall CVD reactor. In order to nucleate and grow a desired alumina polymorph (α/κ) in each layer, thin α- and κ-modification layers were deposited between the alumina layers. This investigation examines the interfacial structure of the κ-modification and the alumina layers. The materials were examined using a combination of XRD, SEM, TEM and EDX.

The κ-modification layers exhibited an FCC structure and were composed of (Ti,AI)(C,O). Orientation relationships were frequently found at the (i) α-A12O3/κ-modification/κ-A12O3 layer interfaces and (ii) κ- A12O3/κ-modification/κ- A12O3 layer interfaces:

Type
Research Article
Copyright
Copyright © Materials Research Society 1993

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