Hostname: page-component-848d4c4894-tn8tq Total loading time: 0 Render date: 2024-06-30T07:28:29.938Z Has data issue: false hasContentIssue false

Microstructural Characterisation of Pb(Zr0.52Ti0.48)O3 Thin Films Deposited on RuO2 Electrodes by Laser Ablation

Published online by Cambridge University Press:  10 February 2011

A De Benedittis
Affiliation:
INFM-Università di Ancona, Dipartimento di Scienze dei Materiali e della Terra, Via Brecce Bianche, 1–60131 Ancona, Italy
A. Di Cristoforo
Affiliation:
INFM-Università di Ancona, Dipartimento di Scienze dei Materiali e della Terra, Via Brecce Bianche, 1–60131 Ancona, Italy
P. Mengucci
Affiliation:
INFM-Università di Ancona, Dipartimento di Scienze dei Materiali e della Terra, Via Brecce Bianche, 1–60131 Ancona, Italy
G. Majni
Affiliation:
INFM-Università di Ancona, Dipartimento di Scienze dei Materiali e della Terra, Via Brecce Bianche, 1–60131 Ancona, Italy
A. Diodati
Affiliation:
Istituto MASPEC/CNR, Via Chiavari 18a, 1–43 100 Parma, Italy, leccabue@prmasp.bo.cnr.it
F. Leccabue
Affiliation:
Istituto MASPEC/CNR, Via Chiavari 18a, 1–43 100 Parma, Italy, leccabue@prmasp.bo.cnr.it
B.E. Watts
Affiliation:
Istituto MASPEC/CNR, Via Chiavari 18a, 1–43 100 Parma, Italy, leccabue@prmasp.bo.cnr.it
D. Seuret
Affiliation:
Istituto MASPEC/CNR, Via Chiavari 18a, 1–43 100 Parma, Italy, leccabue@prmasp.bo.cnr.it
J. Smeets
Affiliation:
VITO-Materials Division, Boeretang 200, B-2400 Mol, Belgium
Get access

Abstract

An aspect which has hindered the development of ferroelectric memories is dielectric fatigue and to resolve this conducting oxides are promising candidates as an electrode material for lead zirconate titanate thin films. In this work ferroelectric films have been grown by pulsed laser deposition on ruthenium oxide electrodes. The phase distribution, microstructure and the effect of subsequent heat treatment have been studied by grazing angle X ray diffraction and electron microscopy; the results and implications for use of RuO2 as the bottom electrode during vapour phase deposition are discussed.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Krusin-Elbaum, L., Wittmer, M. and Yee, D.S., Appl. Phys. Lett. 50, 1879 (1987).Google Scholar
2. Vijay, D.P. and Desu, S.B., J. Electrochem. Soc. 140, 2640 (1993).Google Scholar
3. Ramesh, R., Sands, T., Keramidas, V.G. and Fork, D.K., in Ferroelectric Thin Films III, edited by Myers, E.R., Tuttle, B.A., Desu, S.B. & Larsen, P.K. (Mat. Res. Soc. Symp. Proc. 310, Pittsburgh, PA, 1993) pp. 195200.Google Scholar
4. Kolawa, E., So, F.C.T., Pan, E. T-S and Nicolet, M-A., Appl. Phys. Lett. 50, 854 (1987).Google Scholar
5. Grill, A., Beach, D., Smart, C. and Kane, W., in Ferroelectric Thin Films III, edited by Myers, E.R., Tuttle, B.A., Desu, S.B. & Larsen, P.K. (Mat. Res. Soc. Symp. Proc. 310, Pittsburgh, PA, 1993) pp. 189194.Google Scholar
6. Hase, T., Sakuma, T., Amanuma, K., Mori, T., Ochi, A. and Miyasaka, Y., Integrated Ferroelectrics 8, 833 (1995).Google Scholar
7. Al-Shareef, H.N., Tuttle, B.A., Warren, W.L., Headley, T.J., Dimos, D., Voigt, J.A. and Nasby, R.D., J. Appl. Phys. 79, 1013 (1996).Google Scholar
8. Horwitz, J.S., Grabowski, K.S., Chrisey, D.B. and Leuchtner, R.E., Appl. Phys. Lett. 59, 1565 (1991).Google Scholar
9. Rodríguez, H., Watts, B.E., Leccabue, F., Melioli, E. and Panizzieri, R., MASPEC/CNR Internal Report No. 77, Parma, Italy, September 1994.Google Scholar