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Mîcromagnetic Modeling of the Behavior of Magnetostrictive Films under Stress

  • Y. C. Shu (a1) and J. H. Yen (a1)

Abstract

We study the effect of stress on the behavior of magnetostrictive films. Our approach is different from the conventional one which neglects the strain compatibility. Here, we include the kinematic constraint in our micromagnetic model and proposed to use the average to calculate the stress-induced magnetic field. The analytic formulation of magnetostrictive energy is derived which enables us to perform simulation at a large scale with few iteration steps. The simulation results show that the conventional approach is insufficient to predict magnetic domain patterns for materials with large magnetostriction, and the effect of intrinsic stress cannot be neglected.

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Mîcromagnetic Modeling of the Behavior of Magnetostrictive Films under Stress

  • Y. C. Shu (a1) and J. H. Yen (a1)

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