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Microfabricated Tem Sections

Published online by Cambridge University Press:  21 February 2011

H. W. Deckman
H. W. Deckman*
Affiliation:
Exxon Research and Engineering Co., Clinton Township, Annandale, New Jersey 08801
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Abstract

A simple convenient technique is described for fabricating 25-5,000Å sized microstructures which are suitable for use as thin sections in transmission electron microscopy. Microstructures are produced by reactive ion beam etching (RIBE) a submonolayer colloidal particle mask, and several effects seen in RIBE are discussed. In particular, it is shown that polymeric deposits formed on vertical side walls can be imaged and etch rates near the surface of some materials can differ substantially from the bulk. The microfabrication technique affords a simple method to study the internal structure of thin deposited films and use of the technique is illustrated with structural studies of amorphous semiconductor superl atti ces.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 38: Symposium F – Plasma Synthesis and Etching of Electronic Materials , 1984 , 215
Copyright
Copyright © Materials Research Society 1985

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