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Metal-Organic Chemical Vapor Deposition of Metal Oxides: from Precursor Synthesis to Thin Films

  • J. A. Belot (a1), A. Wang (a1), N. L. Edleman (a1), J. R. Babcock (a1), M. V. Metz (a1), T. J. Marks (a1), P. R. Markworth (a2) and R. P. H. Chang (a2)...

Abstract

This contribution describes the synthesis, characterization, and implementation of new lanthanide and main group metal-organic chemical vapor deposition precursors based on the 2,2-dimethyl-5-N-2-methoxyethylimino-3-hexanonato ligand system. The new homoleptic, fluorinefree, low melting, and highly volatile complexes are ideally suited for oxide MOCVD, and in many applications are superior to standard β-diketonates while maintaining ease of synthesis and low cost. This is explicitly demonstrated by the growth of high quality CeO2/YBa2Cu3O7-δ multilayers.

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Metal-Organic Chemical Vapor Deposition of Metal Oxides: from Precursor Synthesis to Thin Films

  • J. A. Belot (a1), A. Wang (a1), N. L. Edleman (a1), J. R. Babcock (a1), M. V. Metz (a1), T. J. Marks (a1), P. R. Markworth (a2) and R. P. H. Chang (a2)...

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