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The Mechanical Properties of Electroplated Cu Thin Films Measured by means of the Bulge Test Technique

Published online by Cambridge University Press:  21 March 2011

Yong Xiang ,
Xi Chen  and
Joost J. Vlassak
Yong Xiang
Affiliation:
Division of Engineering and Applied Sciences, Harvard University Cambridge, MA 02138, U.S.A.
Xi Chen
Affiliation:
Division of Engineering and Applied Sciences, Harvard University Cambridge, MA 02138, U.S.A.
Joost J. Vlassak
Affiliation:
Division of Engineering and Applied Sciences, Harvard University Cambridge, MA 02138, U.S.A.
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Abstract

The mechanical properties of freestanding electroplated Cu films were determined by measuring the deflection of Si-framed, pressurized membranes. The films were deformed under plane-strain conditions. The pressure-deflection data are converted into stress-strain curves by means of simple analytical formulae. The microstructure of the Cu films was characterized using scanning electron microscopy and x-ray diffraction. The yield stress, Young's modulus, and residual stress were determined as a function of film thickness and microstructure. Both yield stress and Young's modulus increase with decreasing film thickness and correlate well with changes in the microstructure and texture of the films.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 695: Symposium L – Thin Films: Stresses and Mechanical Properties IX , 2001 , L4.9.1
Copyright
Copyright © Materials Research Society 2002

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References

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