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Measuring Bimodal Crystallographic Texture in Ferroelectric PbZrxTi1-x O3 Thin Films

Published online by Cambridge University Press:  10 February 2011

Mark D. Vaudin  and
Glen R. Fox
Mark D. Vaudin
Affiliation:
Ceramics Division, NIST, Gaithersburg, MD 20899-8522
Glen R. Fox
Affiliation:
Ramtron International Corporation, Colorado Springs, CO 80921
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Abstract

A powder x-ray diffraction method has been developed to quantify textured volume fractions in thin films. It has been applied to {111}, {100} and randomly oriented PbZrxTi1-xO3 in 200 nm thick films used for ferroelectric random access memory applications. The integrated and peak intensities of 100, 110, 200 and 222 Bragg peaks from an untextured PZT film were determined by applying a thickness correction to a θ–2θ scan obtained from random powder of the same composition as the film. X-ray scans were made on the same peaks from the PZT film specimens. The distributions of grain orientation for the {111} and {100} populations in the films were determined from ω scans which were obtained from the films using 100, 200 and 222 scattering angles and corrected for defocussing and absorption. To determine the total volume fraction of each population of grains, the ratios of the integrated film peak intensities to the corrected powder integrated peak intensities were multiplied by the integrals of the corrected ω scans.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 596: Symposium Y – Ferroelectric Thin Films VIII , 1999 , 363
Copyright
Copyright © Materials Research Society 2000

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References

1. Chen, S. and Chen, I., J. Am. Ceram. Soc. 77, p. 2337 (1994).Google Scholar
2. Brooks, K. G., Reaney, I. M., Klissurska, R., Huang, Y., Bursill, L., and Setter, N., J. Mater. Res. 9, p. 2540 (1994).Google Scholar
3. Peterson, C. R., Medendorp, N. W., Slamovich, E. B., and Bowman, K. J., (Mater. Res. Soc. Proc. 433, Pittsburgh, PA 1996), p. 297–302.Google Scholar
4. Fox, G. R., in Ferroelectric thin Films VII, edited by Jones, R. E., Schwartz, R. W., Summerfelt, S. R., and Yoo, I. K., (Mater. Res. Soc. Proc. 541, Pittsburgh, PA 1998), p. 529–534.Google Scholar
5. Warren, B. E., X-Ray Diffraction, Dover Publications, New York, 1990, chapter 4.Google Scholar
6. Vaudin, M. D., Proceedings of the Twelfth International Conference on Textures of Materials, edited by Szpunar, J. A. (NRC Research Press, Ottawa, 1999), p. 186–191.Google Scholar