Hostname: page-component-78c5997874-fbnjt Total loading time: 0 Render date: 2024-11-18T01:13:08.707Z Has data issue: false hasContentIssue false

MBE Growth of Mercury Cadmium Telluride: Issues and Practical Solutions

Published online by Cambridge University Press:  25 February 2011

J. W. Cook Jr.
Affiliation:
North Carolina State University, Department of Physics, Raleigh, NC 27695-8202
K. A. Harris
Affiliation:
North Carolina State University, Department of Physics, Raleigh, NC 27695-8202
J. F. Schetzina
Affiliation:
North Carolina State University, Department of Physics, Raleigh, NC 27695-8202
Get access

Abstract

The growth of thin films of mercury-based materials by molecular beam epitaxy (MBE) presents significant experimental problems which must be overcome in order to successfully grow infrared detector materials such as mercury cadmium telluride (MCT). Many of the problems associated with the use of Hg in MBE arise from its high room temperature vapor pressure (2 mTorr) and its low sticking coefficient. The MBE system must be designed for Hg usage by considering such things as the ultra high vacuum pumping system, the Hg source, Hg containment, and Hg removal. In addition, Hg is a toxic heavy metal and must be handled appropriately. Other problems involved with the growth of MCT are associated with the design of the MBE furnaces which are used to evaporate cadmium telluride and tellurium.

Type
Research Article
Copyright
Copyright © Materials Research Society 1987

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Faurie, J. P. and Million, A., J. Crystal Growth 54, 582 (1981).Google Scholar
2. Faurie, J. P. and Million, A., Appl. Phys. Lett. 41, 264 (1982).Google Scholar
3. Harris, K. A. and Cook, J. W. Jr., J. Vac. Sci. Technol. A, xxx (1987).Google Scholar
4. Harris, K. A., Hwang, S., Blanks, D. K., Cook, J. W. Jr., Schetzina, J. F., and Otsuka, N., J. Vac. Sci. Technol. A 4, 2061 (1986).Google Scholar
5. Harris, K. A., Hwang, S., Blanks, D. K., Cook, J. W. Jr., Schetzina, J. F., Otsuka, N., Baukus, J. P., and Hunter, A. T., Appl. Phys. Lett. 48, 396 (1986).Google Scholar
6. Harris, K. A., Hwang, S., Lansari, Y., Cook, J. W. Jr., and Schetzina, J. F., Appl. Phys. Lett. 49, 713 (1986).Google Scholar
7. Harris, K. A., Hwang, S., Lansari, Y., Cook, J. W. Jr., and Schetzina, J. F., J. Vac. Sci. Technol. A, xxx (1987).Google Scholar