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Material and Electrical Characterization of Nickel Silicide-Carbon as Contact Metal to Silicon-Carbon Source and Drain Stressors

  • Rinus Tek Po Lee (a1), Li-Tao Yang (a2), Kah-Wee Ang (a3), Tsung-Yang Liow (a4), Kian-Ming Tan (a5), Andrew See-Weng Wong (a6), Ganesh S. Samudra (a7), Dong-Zhi Chi (a8) and Yee-Chia Yeo (a9)...

Abstract

In this paper, the material and electrical characteristics of Nickel-Silicon-Carbon (NiSi:C) films were investigated for the first time to ascertain the compatibility of NiSi:C contacts to silicon-carbon (Si:C) source/drain stressors. The incorporation of 1 atomic percent of carbon was found to increase both the Ni2Si-to-NiSi and NiSi-to-NiSi2 transformation temperatures. Our results show that the incorporation of carbon stabilizes the interfacial and surface morphology of NiSi:C films. We speculate that the incorporated carbon segregates into the NiSi:C grain boundaries and suppresses film agglomeration and NiSi-to-NiSi2 phase transformation. X-ray diffraction analysis further revealed that the formed NiSi:C films possessed a preferred orientation. Current-voltage measurements for NiSi and NiSi:C n+/p junctions exhibit similar cumulative distribution for junction leakage indicating that carbon incorporation does not have a detrimental impact on the n+/p junction integrity. Our results suggest that NiSi:C is a suitable self-aligned contact metal silicide to n-channel MOSFETs with SiC S/D stressors in a similar manner to the way in which NiSiGe is used for p-channel MOSFETs with SiGe S/D stressors.

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1. Yeo, Y.-C., “Enhancing CMOS transistor performance using lattice-mismatched materials in source/drain regions,” Semiconductor Science and Technology, vol. 22, pp. S177–S182, Jan. 2007.
2. Yeo, Y.-C., “Strained-silicon transistors with silicon-carbon source/drain,” Extended Abstracts of the 2006 International Conference on Solid State Devices and Materials, Yokohama, Japan, Sep. 13-15, 2006, pp. 162163.
3. Ghani, T., Armstrong, M., Auth, C., Bost, M., Charvat, P., Glass, G., Hoffmann, T., Johnson, K., Kenyon, C., Klaus, J., McIntyre, B., Mistry, K., Murthy, A., Sandford, J., Silberstein, M., Sivakumar, S., Smith, P., Zawadzki, K., Thompson, S., Bohr, M., “A 90nm high volume manufacturing logic technology featuring novel 45nm gate length strained silicon CMOS transistors,” IEEE International Electron Device Meeting 2003 Tech. Dig., pp. 978980, December 2003.
4. Ang, K. W., Chui, K. J., Bliznetsov, V., Du, A., Balasubramanian, N., Li, M. F., Samudra, G., Yeo, Y.-C., “Enhanced performance in 50 nm N-MOSFETs with silicon-carbon source/drain regions,” IEEE International Electron Device Meeting 2006 Tech. Dig., pp. 10691071, December 2004.
5. Ang, K.-W., Chui, K.-J., Tung, C.-H., Balasubramanian, N., Li, M.-F., Samudra, G. S., and Yeo, Y.-C., “Enhanced strain effects in 25 nm gate length thin-body N-MOSFETs with silicon-carbon source/drain and tensile stress liner,” IEEE Electron Device Letters, vol. 28, no. 4, pp. 301304, Apr. 2007.
6. Liow, T.-Y., Tan, K.-M., Chin, H.-C., Lee, R. T. P., Tung, C.-H., Samudra, G. S., Balasubramanian, N., and Yeo, Y.-C., “Carrier transport characteristics of sub-30 nm strained n-channel FinFETs featuring silicon-carbon source/drain regions and methods for further performance enhancement,” IEEE International Electron Device Meeting 2006 Tech. Dig., pp. 473476, Dec. 2006.
7. Lee, R. T. P., Liow, T.-Y., Tan, K.-M., Lim, A. E.-J., Wong, H.-S., Lim, P.-C., Lai, D. M.Y., Lo, G.-Q., Tung, C.-H., Samudra, G., Chi, D.-Z., and Yeo, Y.-C., “Novel nickel-alloy silicides for source/drain contact resistance reduction in n-channel multiple-gate transistors with sub-35 nm gate length,” IEEE International Electron Device Meeting 2006 Tech. Dig., pp. 851854, Dec. 2006.
8.Properties of Metal Silicides, EMIS Data Reviews Series No. 14, edited by Maex, K., and Rossum, M.V. (INSPEC, London, 1995.

Keywords

Material and Electrical Characterization of Nickel Silicide-Carbon as Contact Metal to Silicon-Carbon Source and Drain Stressors

  • Rinus Tek Po Lee (a1), Li-Tao Yang (a2), Kah-Wee Ang (a3), Tsung-Yang Liow (a4), Kian-Ming Tan (a5), Andrew See-Weng Wong (a6), Ganesh S. Samudra (a7), Dong-Zhi Chi (a8) and Yee-Chia Yeo (a9)...

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