Skip to main content Accessibility help

Maskless Patterning and Structuring on Ultra-Hard Film Materials

  • J.K. Park (a1), V.M. Ayres (a2), J. Asmussen (a2) and K. Mukherjee (a1)


Ultra-hard film materials such as chemical vapor deposited (CVD) diamond are uniquely qualified for applications where superior tribological and electronic properties are required. Patterning of the film materials is essential to produce functional micro devices. Conventional lithography-based chemical etching is difficult or impossible on the ultra-hard diamond film materials, which have a high chemical resistance. Investigations on maskless patterning of the CVD diamond film are presented. Focused excimer laser pulses are used for dry etching on the film materials, and a micro computer numerical control (micro-CNC) stage is used for patterned translation of a target. The laser ablation of CVD diamond is observed to set up relationships among the processing parameters, such as the gas processing environments, the laser energy fluence and the number of laser pulses. The extent of the ablation-induced plasma is observed by time integrated image capturing. A cell-patterned structure, fabricated by the innovative maskless process, is presented for discussion.



Hide All
1. Shikata, S., MRS Bulletin, 23, 61 (1998).10.1557/S0883769400029390
2. Tokarev, V.N., Wilson, J.I.B., Jubber, M.G., John, P., and Milne, D.K., Diamond and Related Materials, 4, 169 (1995).
3. Boudina, A., Fitzer, E., Wahl, G., and Esrom, H., Diamond and Related Materials, 2, 678 (1993).10.1016/0925-9635(93)90203-E
4. Pimenov, S.M., Smolin, A.A., Ralchenko, V.G., Konov, V.I., Likhanski, S.V., Veselovski, I.A., Sokolina, G.A., Bantsekov, S.V., and Spitsyn, B.V., Diamond and Related Materials, 2, 291 (1993).
5. Johnston, C., Chalker, P.R., Buckley-Golder, I.M., Marsden, P.J., and Williams, S.W., Diamond and Related Materials, 2, 829 (1993).
6. Srinivasan, R., Braren, B., Casey, K.G. and Yeh, M., Applied Physics Letters, 26, 2790 (1989).
7. Mukherjee, K., Kim, T.H., and Walter, W.T. in Lasers in Metallurgy, edited by Mukherjee, K. and Mazumder, J. (The Metallurgical Society of AIME, Chicago, IL, 1981) p. 137.

Maskless Patterning and Structuring on Ultra-Hard Film Materials

  • J.K. Park (a1), V.M. Ayres (a2), J. Asmussen (a2) and K. Mukherjee (a1)


Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed