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Maskless Deposition of a Micropattern on a Wafer by Liquid Flow

  • S. Mil’shtein (a1) and C. Fournier (a1)

Abstract

Metalization patterns of micron size were deposited chemically on GaAs wafers with no litography masks by means of controlled laminar flow of liquid NaOCl. Iron used for metalization was dissolved in NaOCl wafer solution. To interrupt the continuous deposition of metal on semiconductor surface, the acrylic polymer was also dissolved in the liquid. Iron deposition appears to follow given crystalographic direction <110> creating a set of parallel lines in <110> direction. Spacing between the lines and width of the metallic lines are controlled by the temperature of the process, speed of liquid flow and percentage of polymer present in the solution.

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1. Mil’shtein, S. and Fournier, C., Materials Letters, Vol. 5, No. 7,8 (1987) 258259.
2. Mil’shtein, S. and Fournier, C., U.S. Patent Pending, Ser. No. 07/152, 155 2/4/88.
3. Mil’shtein, S. and Fournier, C., Materials Letters, will be published (1990).

Maskless Deposition of a Micropattern on a Wafer by Liquid Flow

  • S. Mil’shtein (a1) and C. Fournier (a1)

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