Skip to main content Accessibility help

Magnetron Enhanced Reactive Ion Etching in a Hexode System

  • Scott Bell (a1) and Thijs Bril (a1)


A method of forming a uniform magnetic field in a modified hexode type etch system is described.Experimental results of etching Si, SiO2 and photoresist with NF3 are presented.The magnetic field effectively increases the ion flux and decreases the energy of the ions bombarding the cathode.It was found that adding a magnetic field increases the etchrate of Si for the conditions studied, but for SiO2 and photoresist, the decreased ion bombardment energy leads to lower etchrates under certain conditions.The resulting effect on selectivities is discussed.



Hide All
1. Reinberg, A. R, Avem, J.Dalle, Steinberg, G., and Bruce, R.H., Electrochemical Society, Extended Abstract No.275, (1981).
2. Suzuki, K., Okudaira, S., Sakudo, N., and Kanomata, I., Jpn.J.Appl.Phys. 16, 1979 (1977).
3. Dzioba, S., Este, G., and Naguib, H.M., J.Electrochem.Soc. 129, 2537 (1982).
4. Nishimatsu, S., Suzuki, K., Ninomiya, K., and Okudaira, S., 1982 Dry Process Symposium, 1982, p.11.
5. Zarowin, C.B., Steinberg, G.N., and Reinberg, A.R., Electrochemical Society, Extended Abstract No.157, p.253, (1983).
6. Horiike, Y., Okano, H., Yamazaki, T., and Horie, H., Jpn., J.Appl.Phys. 20, L817 (1981).
7. Thornton, J.A. and Penfold, A.S., in Thin Film Processes, edited by Vossen, J.L. and Kern, W. (Academic Press, New York, 1978), p.176.
8. Chapman, B., Glow Discharge Processes, (John Wiley & Sons, New York, 1980).p.265.
9. I, Lin, Hinson, D.C., Class, W.H., Sanstrom, R.L., and Pasierb, F., Proc.4th Symp.on Plasma Processing, San Francisco, 1983, ECS Proc.Vol.83–10, 132 (1983).
10. Logan, J.S., Mazza, N.M., and Davidse, P.D., J.Vac.Sci.Technol. 6 (1), 120 (1969).
11. van den Hoek, W.G.M., Proc.Symp.on Plasma Processing, Palo AIto, 1986, MRS Proc.Vol.68, Abstract No.C2.4 (1986).
12. Emmi, F., Egitto, E., and Horwath, R., Proc.5th Symp.on Plasma Processing, Toronto, 1985, ECS Proc.Vol.85–1, 193 (1985).


Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed