Hostname: page-component-8448b6f56d-t5pn6 Total loading time: 0 Render date: 2024-04-16T14:28:01.686Z Has data issue: false hasContentIssue false

Magnetostriction and Microstructure of As-Deposited and Annealed Co Thin Films

Published online by Cambridge University Press:  21 March 2011

Winfried Brückner
Affiliation:
Institute for Solid State and Materials Research Dresden, D-01171 Dresden, Germany
Michael Hecker
Affiliation:
Institute for Solid State and Materials Research Dresden, D-01171 Dresden, Germany
Jürgen Thomas
Affiliation:
Institute for Solid State and Materials Research Dresden, D-01171 Dresden, Germany
Detlev Tietjen
Affiliation:
Institute for Solid State and Materials Research Dresden, D-01171 Dresden, Germany
Claus M. Schneider
Affiliation:
Institute for Solid State and Materials Research Dresden, D-01171 Dresden, Germany
Get access

Abstract

The magnetostriction of as-sputtered and annealed 400 nm thick Co films has been studied in longitudinal and transverse magnetic fields. The appreciable change of the magnetostriction behavior after annealing above 250 °C is correlated to grain growth and to the related change of the texture (from nearly randomly distributed hcp-Co crystallites to a c-axes texture perpendicular to the film plane). The magnetostriction behavior in the annealed samples cannot be explained by a domain magnetization within the film plane. It is assumed that a rotation of the spontaneous magnetization out of the film plane occurs due to the development of a perpendicular magnetic anisotropy.

Type
Research Article
Copyright
Copyright © Materials Research Society 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Mosca, D.H., Petroff, F., Fert, A., Schroeder, P.A., Pratt, W.P. Jr, and Laloee, R., J. Magn. Magn. Mat. 94, L1 (1991).Google Scholar
[2] Weihnacht, V., Brückner, W., and Schneider, C.M., Rev. Sci. Instrum. 71, 4479 (2000).10.1063/1.1326925Google Scholar
[3] Brückner, W., Lang, C., and Schneider, C.M., Rev. Sci. Instrum. 72, (2001) (in press).10.1063/1.1362436Google Scholar
[4] Brückner, W., Weihnacht, V., Pitschke, W., Thomas, J., and Baunack, S., J. Mater. Res. 14, 1286 (1999).Google Scholar
[5] Brückner, W., Pitschke, W., Baunack, S., and Thomas, J., J. Mater. Res. 15, 1062 (2000).Google Scholar
[6] Hesemann, H.Th., Müllner, P., Kraft, O., and Arzt, E. in Thin Films: Stresses and Mechanical Properties VIII, edited by Vinci, R., Kraft, O., Moody, N., Besser, P., and Shaffer, E. II, (Mater. Res. Soc. Symp. Proc. 594, Warrendale, PA, 2000) pp. 219224.Google Scholar
[7] Klokholm, E. and Aboaf, J., J. Appl. Phys. 53, 2661 (1982).Google Scholar
[8] , Landolt-Börnstein, Zahlenwerte und Funktionen (Springer, Berlin, 1962), vol. II/9, pp.1123ff.Google Scholar
[9] Schelp, L.F., Viegas, A.D.C., Carara, M., and Schmidt, J.E., J. Magn. Magn. Mat. 139, 59 (2000).10.1016/0304-8853(95)90028-4Google Scholar
[10] Lacheisserie, E. du Tremolet de, Magnetostriction (CRC, Boca Raton, FL, 1993) pp. 43ff.Google Scholar
[11] Riet, E. van de, J. Appl. Phys. 76, 584 (1994).Google Scholar
[12] Magnetic properties of metals, edited by Wijn, H.P.J. (Springer, Berlin, 1991) p.14.Google Scholar
[13] Hubert, A. and Schäfer, R., Magnetic Domains (Springer, Berlin, 1998) pp. 177 ff.Google Scholar