Hostname: page-component-848d4c4894-cjp7w Total loading time: 0 Render date: 2024-06-21T06:21:08.948Z Has data issue: false hasContentIssue false

Luminescence Properties of Eu ion-implanted GaN

Published online by Cambridge University Press:  01 February 2011

Shin-ichiro Uekusa
Affiliation:
Department of Electrical and Electronic Engineering, Meiji University, 1–1–1 Higashi-mita, Tama-ku, Kawasaki, Kanagawa, 214–8571, Japan
Isao Tanaka
Affiliation:
Department of Electrical and Electronic Engineering, Meiji University, 1–1–1 Higashi-mita, Tama-ku, Kawasaki, Kanagawa, 214–8571, Japan
Get access

Abstract

The Eu ion was implanted at an energy of 300keV with a dose of 1×1015cm-2 at room temperature. Photoluminescence (PL) and PL lifetime were characterized and studied on thermal quenching process. We calculated the activation energy (E1) of temperature dependent PL and the value of E1 was 5.68meV. E1 was affected the luminescence intensity in the temperature range from 15K to 70K. The activation energy (Ea) of PL lifetime was calculated and the value of Ea was 8.5meV. The non-radiative recombination in the transition from the 5D0 to 7F2 of Eu was dominated in the temperature range from 15K to 100K. We found that the thermal quenching occurred in both the electron emission from RE-trap and the non-radiative recombination in the transition on Eu in the temperature range from 15K to 70K.

Type
Research Article
Copyright
Copyright © Materials Research Society 2004

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCE

1. Katsumata, H., Uekusa, S., Majima, A. and Kumagai, M., J. Appl. phys. 77, 1881 (1995)Google Scholar
2. Katsumata, H., Uekusa, S. and Sai, H., J. Appl. phys. 80, 2383 (1996)Google Scholar
3. Uekusa, S. and Hirano, T., Proc. Int. Workshop on Nitride Semiconductor, IWN2000, 498 (2000)Google Scholar
4. Uekusa, S. and Hirano, T., Mat. Res. Soc. Symp. Proc. Vol. 639, G6.15.1 (2001)Google Scholar
5. Uekusa, S., Tanaka, I. and Arai, T., Mat. Res. Soc. Symp. Proc. Vol.744 [M8.29]Google Scholar
6. Nakanishi, Y. et al., Nucl. Instr. And Meth in Phys. Res. B 206 (2003) 10331036 Google Scholar
7. Nakanishi, Y. et al., Proc. Int. Workshop on Nitride Semiconductor, IWN2000, 486 (2000)Google Scholar
8. Tanaka, I., Uekusa, S., Proc. 21th. Symp. Mat. Sci. Eng. Res. Center of Ion Beam Tech. Hosei Univ. Vol. 21 pp. 23 Google Scholar
9. Nogami, M., Enomoto, T. and Hayakawa, T., J. Luminescence 97 (2002) 147152 Google Scholar
10. Wilson, B.A., Yen, W.M., Hegarty, J., and Imbusch, G‥ F., Phys. Rev. B19 (1979) 4238 Google Scholar
11. Massa, J.S., Buller, G.S., Walker, A.C., Smpon, J., Prior, K.A., and Cavenett, B.C.: Appl. Phys. Lett. 67 (1995) 61 Google Scholar