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Lpcvd Polycrystalline Silicon Thin Films: The Evolution of Structure, Texture and Stress

  • P. Krulevitch (a1), Tai D. Nguyen (a2) (a3), G. C. Johnson (a1), R. T. Howe (a4), H. R. Wenk (a5) and R. Gronsky (a2)...


An investigation of undoped LPCVD polycrystalline silicon films deposited at temperatures ranging from 605 to 700 C and silane pressures from 300 to 550 mTorr revealed large variations in stress with processing conditions and a correlation between stress and texture. TEM and HRTEM analysis show that morphology differences also exist. At lower temperatures (≈605 C) and higher pressures (≈400 mTorr), the films appear to deposit in an amorphous state and crystallize during the deposition to form microstructures characterized by equi-axed grains, tensile residual stress, and a texture with {110} and {11/} (/=2 or 3) components. Higher temperatures (between 620 and 650 C) produce films that nucleate at the Si02 interface, creating a {110} oriented columnar microstructure. At 700 C, the grains are still columnar, but the dominant texture is {100}. Films deposited at temperatures greater than 620 C exhibit compressive stress, and some contain regions of hexagonal silicon. This paper proposes possible causes of the varying stresses, textures, and microstructures in the films.



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1. Kamins, T.I., Polycrystalline Silicon For Integrated Circuit Applications, (Kluwer Academic Publishers, Boston, 1988).
2. Howe, R.T., J. Vacuum Sci. Tech. B. 6, 1809 (1988).
3. Harbeke, G., Krausbauer, L., Steigmeier, E.F., Widmer, A.E., Kappert, H.F., and Neugebaur, G., RCA Review, 44, 287 (1983).
4. Brokman, A., Gat, R., and Alpem, Y.. Appl. Phys. Lett., 49, 382 (1986).
5. Hendriks, M., Delhez, R.. de Keijser, Th.H., Radelaar, S., Habraken, F.H.P.M., Kuiper, A.E.T., and Boudewijn, P.R., J. Appl. Phys., 56, 2751 (1984).
6. Koleshko, V.M., Belitsky, V.F., and Kiryushin, I.V., Thin Solid Films, 162. 365 (1988).
7. Guckel, H., Bums, D.W., Visser, C.C.G., Tilmans, H.A.C., and Deroo, D., IEEE Trans. Electron Devices, ED–35, 800 (1988).
8. Adamczewska, J. and Budzynski, T., Thin Solid Films, 113, 271 (1984).
9. Huang, J., Krulevitch, P., Johnson, G.C., Howe, R.T., and Wenk, H.R., Mat. Res. Soc. Symp. Proc., 182, 201 (1990).
10. Nguyen, T.D., Gronsky, R., and Kortright, J.B., Cross-sectional Transmission Electron Microscopy of Multilayer Thin Film Structures (submitted to Journal of Electron Microscopy Techniques).
11. Wenk, H.R., Sintubin, M., Huang, J.. Johnson, G.C., and Howe, R.T., J. Appl. Phys., 67, 572 (1990).
12. Magarino, J., Kaplan, D., Bisaro, R., Morhange, J.F., and Zelma, K., J. de Physique, 43. cl-271 (1982).
13. Bloem, J.. and Beers, A.M., Thin Solid Films, 124, 93 (1985).
14. Kinsbron, E.. Sternheim, M., and Knoell, R., Appl. Phys. Lett., 42, 835 (1983).
15. Guckel, H., Bums, D.W., Rutigiliano, C.R., Showers, D.K., Uglow, J., Digest of Tech. Papers, Transducers 1987. 277, Tokyo, Japan (1987).
16. van der Drift, A., Philips Res. Repts, 22, 267 (1967).
17. Matson, E.A. and Polyakov, S.A., Phys. Stat. Sol. (a). 41, K93 (1977).
18. Joubert, P., Loisel, B., Chouan, Y., and Haji, L., J. Electrochem. Soc., 134, 2541 (1987).
19. Drosd, R. and Washburn, J.. J. Appl. Phys., 53. 397 (1982).
20. Beers, A.M. and Bloem, J., Appl Phys Lett, 41, 153 (1982).
21. Tsai, C.C., Thompson, R., Doland, C., Ponce, F.A., Anderson, G.B., and Wacker, B., Mat. Res. Soc. Symp. Proc., 118, 49 (1988).
22. Eremenko, V.G. and Nikitenko, V.I., Phys. Stat. Sol. (a), 14, 317 (1972).
23. Tan, Y.T. and , H. II, Phil. Mag. A, 44. 127 (1981).
24. Olijnyk, H.. Sikka, S.K., and Holzapfel, W.B., Phys. Let., 103A, 137 (1984).
25. Hendriks, M. and Radelaar, S., Thin Solid Films, 113, 59 (1984).
26. Pirouz, P., Chaim, R., Dahmen, U., and Westmacott, K.H., Acta Metall. Mater., 38. 313, (1990).
27. Howe, R.T. and Muller, R.S., J. Appl. Phys., 54, 4674 (1983).
28. Kamins, T.I., J. Electrochem. Soc., 121. 681 (1974).

Lpcvd Polycrystalline Silicon Thin Films: The Evolution of Structure, Texture and Stress

  • P. Krulevitch (a1), Tai D. Nguyen (a2) (a3), G. C. Johnson (a1), R. T. Howe (a4), H. R. Wenk (a5) and R. Gronsky (a2)...


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