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Low Teperature Synthesis of Silicon Oxide and Oxynitride Films by Reactive Laser Ablation

Published online by Cambridge University Press:  01 January 1992

E. Fogaassy ,
C. Fuchs ,
A. Slaoui ,
S. De unamumo ,
J.-P. Stoquert ,
W. Marine  and
B. Lans
E. Fogaassy
Affiliation:
Centre de Recherches Nucléaires (IN2P3), Laboratoire PHASE (UPR du CNRS no 292), BP 20, F-67037 Strasbourg Cedex 2, France
C. Fuchs
Affiliation:
Centre de Recherches Nucléaires (IN2P3), Laboratoire PHASE (UPR du CNRS no 292), BP 20, F-67037 Strasbourg Cedex 2, France
A. Slaoui
Affiliation:
Centre de Recherches Nucléaires (IN2P3), Laboratoire PHASE (UPR du CNRS no 292), BP 20, F-67037 Strasbourg Cedex 2, France
S. De unamumo
Affiliation:
Centre de Recherches Nucléaires (IN2P3), Laboratoire PHASE (UPR du CNRS no 292), BP 20, F-67037 Strasbourg Cedex 2, France
J.-P. Stoquert
Affiliation:
Centre de Recherches Nucléaires (IN2P3), Laboratoire PHASE (UPR du CNRS no 292), BP 20, F-67037 Strasbourg Cedex 2, France
W. Marine*
Affiliation:
Centre de Recherches Nucléaires (IN2P3), Laboratoire PHASE (UPR du CNRS no 292), BP 20, F-67037 Strasbourg Cedex 2, France
B. Lans*
Affiliation:
Centre de Recherches Nucléaires (IN2P3), Laboratoire PHASE (UPR du CNRS no 292), BP 20, F-67037 Strasbourg Cedex 2, France
*
*URA CNRS 783, Faculté des Sciences de Luminy, Département de Physique, Case 901, F-13288 Marseille Cedex 9, France
**IPCMS, 4 rue Blaise Pascal, F-67070 Strasbourg Cedex, France
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Abstract

Silicon oxide and oxynitride films are deposited, at low temperature (≤ 450°C) by pulsed ArF excimer laser ablation from silicon, silicon monoxide, fused silica and silicon nitride targets, performed under vacuum and in oxygen atmosphere. We investigate in this paper the specific influence of laser fluence, target materials, substrate temtperature and oxygen pressure on the composition and final properties of SiOxNy grown layers. The synthesis of good quality SiO2 films is demonstratedx. By contrast, the preparation of stoichiometric Si7N4 layers by laser ablation has to be optimized.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 285: Symposium I – Laser Ablation in Materials Processing–Fundamentals and Applications , 1992 , 319
Copyright
Copyright © Materials Research Society 1993

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References

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