Skip to main content Accessibility help

Low Temperature Metal Organic Chemical Vapor Deposition (LTMOCVD) of Electronic Materials

  • Alain E. Kaloyeros (a1), Paul J. Toscano (a2), Richard B. Rizk (a1), Victor Tulchinsky (a1) and Alex Greene (a3)...


High quality amorphous and crystalline silicon carbide thin films were produced by low temperature metal-organic chemical vapor deposition (LTMOCVD) using the organometallic precursor tetraethynylsilane, Si(C2 H)4. LTMOCVD, which was developed by the present investigators, uses single source precursors containing all the elemental constituents desired in the target material already directly bonded. This approach eliminates the inherent limitations of conventional MOCVD where separate precursors are used for each of the individual components of the desired compound. LTMOCVD thus combines the ability to deposit films at low temperatures, which is characteristic of physical deposition techniques, with the ability to provide complete coverage at steps or irregularities on the semiconductor surface, which is characteristic of chemical deposition techniques. In addition, the precursors employed are non-toxic, non-hazardous and easy to handle. Consequently, LTMOCVD can produce compound semiconductors on thermally fragile or chemically sensitive substrates. The SiC films were grown in a hot-wall CVD reactor at a reactor pressure of 10−6-10−3 torr and substrate temperature in the range 300–700°C. Characterization studies were performed using electron diffraction (ED), Auger electron spectroscopy (AES), Rutherford backscattering (RBS), x-ray photoelectron spectroscopy (XPS), and electron energy loss spectroscopy (EELS). The results of these studies showed that the films were uniform, continuous, adherent and highly pure– contaminant levels were below the detection limits of the techniques employed.



Hide All
1 Ghandhi, S.K. and Bhat, I.B., MRS Bulletin 13, 37 (1988).
2 Messier, R., MRS Bulletin 13, 18 (1988).
3 Kukimoto, H., Ban, Y., Komatsu, H., Takechi, M., and Ishizaki, M., J. Cryst. Growth 77, 223 (1986).
4 Bedair, S.M., Whisnant, J.K., Karam, N.H., Griffis, D., El-Masry, N.A., and Stadelmaier, H.H., J. Cryst. Growth 77, 229 (1986).
5 Balk, P., Fischer, M., Grundann, D., Luckerath, R., Luth, H., and Richter, W., J. Vac. Sci. Technol. B5, 1453 (1987).
6 Irvine, S.J.C., CRC Critical Reviews in Solid State and Materials Science 13, 279 (1987).
7 See, for instance, the review article by Kumagai, H. Y., in Chemical Vapor Deposition 1984, edited by Robinson, M. C., Brekel, C. H. J. vanden, Cullen, G. W., Blochner, J. M. Jr, and Rai-Choudhury, P. (the Electrochemical Society, Pennington, NJ, 1984) p. 198.
8 Bozso, F., Yates, J. T. Jr, Choyke, W. J., and Muehlhoff, L., J. Appl. Phys. 57, 2771 (1985).
9 Stinton, D. P., Besmann, T. M., and Lowden, R. A., Ceram. Bull. 67, 350 (1988).
10 Houle, F. A., Appl Phys. A41, 315 (1986).
11 Green, M. L. and Levy, R. A., Metals, J., 63 (June 1985).
12 Könenkamp, R., Phys. Rev. B36 (1987) 2938.
13 Kaloyeros, A.E., Feng, A., Garhart, J., Brooks, K.C., and Williams, W.S., in the Proceedings of the Third Annual Conference on Superconductivity at Buffalo (1989) in press.
14 Kaloyeros, A.E., Hoffman, M.P. and Williams, W.S., Thin Solid Films 141, 237 (1986).
15 Kaloyeros, A.E., Toscano, P.J., and Tulchinsky, V., to be published.
16 Kaloyeros, A.E., Garhart, J., Ghosh, S., Brooks, K.C., Saxena, A., and Luehrs, F., submitted to the Journal of Electronic Materials (1989).
17 Kaloyeros, A.E., Brooks, K.C., Feng, A., and garhart, J., submitted to the Proceedings of the MRS Fall Meeting on High-Temperature Superconductors (Boston, Ma, 1989).
18 Kaloyeros, A.E., Williams, W.S., and Constant, G., Rev. Sci. Instrum. 59, 1209 (1988).

Related content

Powered by UNSILO

Low Temperature Metal Organic Chemical Vapor Deposition (LTMOCVD) of Electronic Materials

  • Alain E. Kaloyeros (a1), Paul J. Toscano (a2), Richard B. Rizk (a1), Victor Tulchinsky (a1) and Alex Greene (a3)...


Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed.