Skip to main content Accessibility help
×
Home

Low Dielectric Constant Fluorocarbon Films

  • K. K. S. Lau (a1) and K. K. Gleason (a1)

Introduction

Chemical vapor deposition (CVD) continues to generate immutable interest as a method of producing thin fluorocarbon films. This impetus stems from both the process advantages of CVD and the extensive market potential for the resultant films. Fluorocarbon films find extremely diverse applications because of their unique electrical, chemical and surface properties. They are currently being evaluated, among other applications, as dielectric interconnects in microelectronic circuits1–3 and as passivation coatings in clinical devices.

Copyright

References

Hide All
1. Endo, K., MRS Bulletin, 22, 55 (1997).
2. Endo, K, Tatsumi, T., Matsubara, Y., Horiuchi, T., Jpn. J. Appl. Phys., Pt. 1 37, 1809 (1998).
3. Labelle, C. B., Gleason, K. K., Limb, S. J., Bums, A. J., Mater. Res. Soc. Symp. Proc. 443, 189 (1997).
4. Ratner, B. D., Chikoti, A., Lopez, G. P., Plasma Deposition and Treatment for Biomedical Applications. In Plasma Deposition, Treatment, and Etching of Polymers; d'Agostino, R., Ed.; (Academic Press: San Diego, 1990), p 463.
5. Panchalingam, V., Poon, B.;, Huo, H. H., Savage, C. R., Timmons, R. B., Eberhart, R. C., J. Biomater. Sci. Polymer Edn. 5, 131 (1993).
6. Limb, S. J., Gleason, K. K., Edell, D. J., Gleason, E. F., J. Vac. Sci. Technol. A 15, 1814 (1996).
7. Booth, J. P., Hancock, G., Perry, N. D., Toogood, M. J., J. Appl. Phys. 66, 5251 (1989).
8. Labelle, C. B., Limb, S. J., Gleason, K. K., J. Appl. Phys., 82, 1784 (1997).
9. Labelle, C. B., Gleason, K. K., Environmental, Safety and Health Issues Associated With Low Dielectric Constant Films Grown By Chemical Vapor Deposition. In 193rd Meeting of The Electrochemical Society, San Diego, CA, May 3-8, 1998.
10. Savage, C. R., , R. B. Timmons, Chem. Mater., 3, 575 (1991).
11. Savage, C. R., Timmons, R. B., Lin, J. W., Spectroscopic Characterization of Films Obtained in Pulsed Radio-Frequency Plasma Discharges of Fluorocarbon Monomers. In Advances in Chemistry Series; American Chemical Society: Washington, DC, 1993; Vol.236, p 745.
12. Wang, J.-H., Chen, J.-J., Timmons, R. B., Chem. Mater. 8, 2212 (1996).
13. Limb, S. J., Edell, D. J., Gleason, E. F., Gleason, K. K., J. Appl. Polym. Sci. 67, 1489 (1998).
14. Limb, S. J., Labelle, C. B., Gleason, K. K., Edell, D. J., Gleason, E. F., Appl. Phys. Lett. 68, 2810 (1996).
15. Yasuda, H., Plasma Polymerization(Academic Press: Orlando, FL, 1985).
16. Plasma Deposition, Treatment, and Etching of Polymers; d'Agostino, R., Ed. (Academic Press: San Diego, 1990).
17. Lau, K. K. S., Gleason, K. K., J. Phys. Chem. B, 101, 6839 (1997).
18. Lau, K. K. S., Gleason, K. K., J. Phys. Chem. B, 102, 5977 (1998).
19. Lau, K. K. S., Gleason, K. K., J. Electrochem. Soc. (submitted).
20. Dixon, W. T., J. Chem. Phys., 77, 1800 (1982).
21. Miller, J. M., Prog. NMR Spectrosc. 28,255 (1996).
22. Harris, R. K., Jackson, P., Chem. Rev. 91, 1427 (1991).
23. Dec, S. F., Wind, R. A., Maciel, G. E., Macromolecules 20, 2754 (1987).
24. Katoh, E., Hiromi, S., Kita, Y., Ando, I., J. Mol. Struct. 355, 21 (1995).
25. Tonelli, C., Tortelli, V., J. Fluorine Chem. 67, 125 (1994).
26. Emsley, J. W., Phillips, L., Prog. NMR Spectrosc. 7, 1 (1971).
27. Tortelli, V., Tonelli, C., Corvaja, C., J. Fluorine Chem. 60, 165 (1993).
28. English, A. D., Garza, O. T., Macromolecules 12, 351 (1979).
29. Limb, S. J., Ph.D. Thesis, Massachusetts Institute of Technology, 1997.
30. Mahler, W., Resnick, R. R., J. Fluorine Chem., 3, 451 (1973).
31. Sargeant, P. B., J. Org. Chem. 35, 678 (1970).
32. Knickelbein, M. B., Webb, D. A., Grant, E. R., (Mater. Res. Soc. Symp. Proc. 38, 1985) p. 23.
33. Labelle, C. B., Karecki, S. M., Reif, R. L., Gleason, K. K.,. J. Vac. Sci. Technol. A (submitted).
34. Ishikawa, N., Maruta, M., Nippon Kagaku Kaishi 10, 1411 (1997).
35. Ovenall, D. W., J.J. Chang,. J. Magn. Reson. 25, 361 (1997).
36. Kaplan, S., Dilks, A., J. Appl. Polym. Sci.: Appl. Polym. Symp. 38, 105 (1984).
37. Mallouk, T., Hawkins, B. L., Conrad, M. P., Zilm, K., Maciel, G.E., Bartlett, N., Phil. Trans. R. Soc. Lond. A 314, 179 (1985).
38. Schwerk, U., Engelke, F., Kleber, R., Michel, D., Thin Solid Films 230, 102 (1993).
39. Hagaman, E. W., Murray, D. K., Cul, G. D. Del, Energy Fuels 12, 399 (1998).
40. Kay, E., Coburn, J., Dilks, A., Plasma Chemistry of Fluorocarbons as Related to Plasma Etching and Plasma Polymerization. In Topics in Current Chemistry; Veprek, S., Venugopalan, M., Eds. (Springer-Verlag: Berlin, 1980) 94, p 1.
41. Burgess, D. R. J., Zachariah, M. R., Tsang, W., Westmoreland, P. R., Prog. Energy Combust. Sci. 21, 453 (1996).
42. Millauer, H., Schwertfeger, W., Siegemund, G., Angew. Chem. Int. Ed. Engl. 24, 161 (1985).

Low Dielectric Constant Fluorocarbon Films

  • K. K. S. Lau (a1) and K. K. Gleason (a1)

Metrics

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed