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Low Coherence Interferometric Metrology for Ultra-thin MEMs Structures

  • Wojciech Walecki (a1), Frank Wei (a1), Phuc Van (a1), Kevin Lai (a1), Tim Lee (a1), Vitali Souchkov (a1), SH Lau (a1) and Ann Koo (a1)...


We present application of low coherence interferometry to characterization of ultra-thin MEMs structures such as membranes in micro-machined devices.



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1. Huang, D., Swanson, E. A., Lin, C. P., Schuman, J. S., Stinson, W. G., Chang, W., Hee, M. R., Flotte, T., Gregory, K., Puliafito, C. A., Fujimoto, J. G., “Optical coherence tomography,” Science 254, 11781181 (1991).
2. Walecki, W.J., Lu, R., Lee, J., Watman, M., Lau, S.H., Koo, A., “Novel non-contact wafer mapping and stress metrologies for thin and ultrathin chip manufacturing applications” 3 rd International Workshop on Thin Semiconductor Devices – Manufacturing and Applications November 25, 2002, Munich, Germany
3. Walecki, W. J., Wei, Frank, Van, Phuc, Lai, Kevin, Lee, Tim, Lau, SH, and Koo, Ann, “Novel Low Coherence Metrology for Nondestructive Characterization of High Aspect Ratio Micro-fabricated and Micro-machined Structures”, accepted for Photonics West: Micromachining and Microfabrication, 24 Jan 2004 - 29 Jan 2004 San Jose, California, USA


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