Skip to main content Accessibility help
×
Home

Location Control of Laterally Columnar Si Grains by Dual-Beam Excimer-Laser Melting of Si Thin-Film

  • Ryoichi Ishihara (a1)

Abstract

The offset of the underlying TiW is introduced in the island of Si, SiO2 and TiW on glass. During the dual-beam excimer-irradiation to the Si and the TiW, the offset in TiW acts as an extra heat source, which melts completely the Si film near the edge, whereas the Si inside is partially melted. The laterally columnar Si grains with a length of 3.2 μm were grown from the inside of the island towards the edge. By changing the shape of the edge, the direction of the solidification of the grain was successfully controlled in such a way that the all grain-boundaries are directed towards the edge and a single grain expands. The grain-boundary-free area as large as 4 μm × 3 μm was obtained at a predetermined position of glass.

Copyright

References

Hide All
1. Ishihara, R. and Matsumura, M.: Jpn. J. Appl. Phys. 36 10 (1997) 6167.
2. Sameshima, T., Usui, S. and Sekiya, M.: IEEE Electron Device Lett. EDL–7 No.5 (1986) 276.
3. Farmakis, F. V., Brini, J., Kamarinos, G., Angelis, C. T., Dimitriadis, C. A. and Miyasaka, M.: Proceedings of the 29th Euro. Solid State Device Res. Conf., (1999) 696.
4. Sposili, R. S. and Im, J. S.: Appl. Phys. Lett. 69 (1996) 2864.
5. Oh, C., Ozawa, M. and Matsumura, M., Jpn. J. Appl. Phys. 37 (1998) L492.
6. Mariucci, L., Carluccio, R., Pecora, A., Foglietti, V., Fortunato, G., Legagneux, P., Pribat, D., Sala, D. Della, J. Stoemanos: Thin Solid Films 337 (1999) 137.
7. Ishihara, R. and Burtsev, A.: Jpn. J. Appl. Phys. 37 3B (1998) 1071.
8. Wilt, P. Ch. van der and Ishihara, R.: Physica Status Solidi (a), 166 2 (1998) 619.
9. Ishihara, R.: Digest of Technical Papers of AMLCD'98 (1998) 153.
10. Hara, A. and Sasaki, N.: Digest of Technical Papers of AMLCD'99 (1999) 275.
11. Shimizu, K., Sugiura, O., and Matsumura, M.: IEEE Trans. Electron Devices Vol. 40 (1993) 112.
12. Ishihara, R., Alkemade, P. and Burtsev, A.: to be published in Jpn. J. Appl. Phys.
13. Venables, J. A. and Harland, C. J.: Phil. Mag., 27 (1973) 1193.
14. Geis, M. W., Smith, H. I., Silversmith, D. J., Mountain, R. W. and Thompson, C. V.: J. Electrochem. Soc. 130 (1983) 1178.

Metrics

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed