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Liquid Delivery CVD of Ferroelectric (Pb,La)(Zr,Ti)O3 Thin Films

  • W. Tao (a1), S.B. Desu (a1), C.H. Peng (a2), B. Dickerson (a1), T.K. Li (a1), C.L. Thio (a1), J.J. Lee (a1) and W. Hendricks (a1)...

Abstract

High quality lanthanum doped PZT films were deposited on platinum coated silicon wafers by direct liquid injection MOCVD using lead bis-tetramethylheptadione, lanthanum tri-tetramethylheptadione, zirconium tetramethylheptadione, and titanium ethoxide as precursors. The films were deposited at 650°C and a reduced pressure of 5 Torr. The deposition rates were higher than 10 nm/min. The liquid delivery system led to highly reproducible deposition rate, composition, and ferroelectric properties in the PLZT films. The remanent polarization of the films decreased from about 25 μC/cm2 for PLZT(0/55/45) to about 12 μC/cm2 for PLZT(8/55/45). The coercive field of the films seemed to be independent on the La doping concentration up to 8% La doping.

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Liquid Delivery CVD of Ferroelectric (Pb,La)(Zr,Ti)O3 Thin Films

  • W. Tao (a1), S.B. Desu (a1), C.H. Peng (a2), B. Dickerson (a1), T.K. Li (a1), C.L. Thio (a1), J.J. Lee (a1) and W. Hendricks (a1)...

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