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Light Bias CPM Study of the Density of States in N-type Amorphous Silicon

Published online by Cambridge University Press:  10 February 2011

Thomas Unold
Affiliation:
National Renewable Energy Laboratory, 1617 Cole Blvd., Golden, CO, 80401
Howard M. Branz
Affiliation:
National Renewable Energy Laboratory, 1617 Cole Blvd., Golden, CO, 80401
Milan Vanecek
Affiliation:
Czech Academy of Sciences, Prague, Czech Republic
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Abstract

We measure subgap absorption on n-type amorphous silicon using the “absolute” constant photocurrent method. We find that for typical monochromator probe beam intensities the measurement is not significantly influenced by lifetime changes. When the measurement is performed under light bias, an apparent increase in the defect absorption coefficient is observed, but no change in the photoexcitation threshold or spectral shape of the absorption band is seen. We show that this increase is likely due to a bias-light amplification of spectrally dependent lifetime changes. Our measurements suggest a larger electron capture cross section of positive valence band tail states compared to neutral dangling bonds.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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