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Lateral Diffusion of NIAL3 and NI2AL3

Published online by Cambridge University Press:  21 February 2011

Joyce. C. Liu  and
J. W. Mayer
Joyce. C. Liu
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14583
J. W. Mayer
Affiliation:
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14583
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Abstract

Phase formation of NiAl3 and Ni2Al3 were studied individually in lateral diffusion couples A and B and simultaneously in sample C. The lateral growth of certain phases was controlled by varying the thickness ratios of Al to Ni at the source and thin film area. Parabolic dependence of the phase width on annealing time was found for NiAl3 and Ni2Al3 in the one-phase and two-phase growth at 425 °C.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 108 , 1987 , 377
Copyright
Copyright © Materials Research Society 1988

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References

REFERENCES

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