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Laser Spectroscopic Investigation of Gas-Phase Processes Relevant to Semiconductor Device Fabrication

  • R. F. Karlicek (a1), V. M. Donnelly (a1) and W. D. Johnston (a1)

Abstract

Chemical vapor deposition (CVD) and plasma etching are important gas-phase techniques used in fabricating semiconductor devices. These processes frequently involve poorly understood multicomponent gas-phase reactions which control reproducibility and product quality. Laser spectroscopic techniques have recently been developed to investigate CVD and plasma etching. These methods offer several advantages for probing complex systems. A comparison of various probing techniques will be presented, and recent results of laser spectroscopic investigations of plasma etching and CVD of silicon and III-V compounds will be reviewed.

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