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Laser Deposition of Molybdenum Oxide Thin Films From Organometallic Precursors

Published online by Cambridge University Press:  21 February 2011

Kurt A. Olson  and
Glenn L. Schrader
Kurt A. Olson
Affiliation:
International Business Machines Corp., East Fishkill Facility, Route 52, Hopewell Junction, NY 12533–0999
Glenn L. Schrader
Affiliation:
Iowa State University, Dept. of Chemical Engineering, 231 Sweeney Hall, Ames, IA 50011–2230
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Abstract

Thin films of crystalline molybdenum oxides were formed on silicon surfaces by laser deposition. An ArF excimer laser was used to photodissociate molybdenum hexacarbonyl in an oxygen-containing ambient. Normal incidence of the laser led to the formation of very thin (< 1000 Å) films of crystalline MO4O11. The films were characterized by color, SEM, Raman spectroscopy, and X-ray diffraction.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 187: Symposium J – Thin Film Structures and Phase Stability , 1990 , 167
Copyright
Copyright © Materials Research Society 1990

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